SCHEMBL22408786

SCHEMBL22408786

OCCc1ccc(CS)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA2 P00918 3/20 0.59
▸ TDP1 Q9NUW8 1/20 0.55
▸ IDO1 P14902 6/20 0.48
▸ CA1 P00915 2/20 0.46
▸ CA12 O43570 1/20 0.46
▸ CA4 P22748 1/20 0.46
▸ CA6 P23280 1/20 0.46
▸ CA5A P35218 1/20 0.46
▸ CA7 P43166 1/20 0.46
▸ CA9 Q16790 1/20 0.46
▸ CA14 Q9ULX7 1/20 0.46
▸ CA5B Q9Y2D0 1/20 0.46
▸ TSHR P16473 1/20 0.46
▸ KDM4E B2RXH2 1/20 0.46
▸ ALDH1A1 P00352 1/20 0.46
▸ ALOX5 P09917 1/20 0.46
▸ GAA P10253 1/20 0.46
▸ MAPT P10636 1/20 0.46
▸ BACE1 P56817 1/20 0.46
▸ CYP4F2 P78329 3/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL40656 0.85 CA2 (0.77) CA2TDP1CA1CA12CA4
SCHEMBL12235091 0.83 CA2 (0.59) CA2TDP1CA1CA12CA4
SCHEMBL6057959 0.82 CA2 (0.72) CA2TDP1CA1CA12CA4
SCHEMBL127369 0.78 IDO1 (0.69) TDP1IDO1TSHRALDH1A1ESR1
SCHEMBL2235297 0.78 CA2 (0.59) CA2TDP1CA1CA12CA4
SCHEMBL2212372 0.78 CA2 (0.59) CA2TDP1IDO1CA1CA12
SCHEMBL7719756 0.77 CA2 (0.65) CA2TDP1CA1CA12CA4
SCHEMBL2044945 0.77 CA2 (0.65) CA2TDP1CA1CA12CA4
SCHEMBL40703 0.77 CA2 (0.65) CA2TDP1CA1CA12CA4
SCHEMBL6073335 0.77 IDO1 (0.52) CA2IDO1CA1CA12CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122070173-A Microfluidic system, reaction method using microfluidic system, and method for producing polymer 株式会社大赛璐 2026-05-19 — — CN disclosed
WO-2025079618-A1 MICROFLUIDIC SYSTEM, REACTION METHOD FOR EMPLOYING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 — — WO disclosed
WO-2025079620-A1 MICROFLUIDIC SYSTEM, PROCESSING METHOD USING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 — — WO disclosed
WO-2025079624-A1 METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 — — WO disclosed
WO-2025079623-A1 METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 — — WO disclosed
WO-2025079622-A1 MICROFLUIDIC SYSTEM, REACTION METHOD USING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 — — WO disclosed
US-20200292939-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE AND METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2020-09-17 — — US disclosed
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