SCHEMBL22444444

SCHEMBL22444444

CCCCCCCCC(O)OC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 7/20 0.46
SPHK1 Q9NYA1 2/20 0.46
FFAR1 O14842 2/20 0.46
LMNA P02545 2/20 0.46
ZDHHC7 Q9NXF8 1/20 0.45
CYP2D6 P10635 2/20 0.43
GMNN O75496 1/20 0.43
POLB P06746 1/20 0.43
THPO P40225 1/20 0.43
MTOR P42345 1/20 0.43
BLM P54132 1/20 0.43
KDM4E B2RXH2 1/20 0.43
TP53 P04637 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
MAPT P10636 1/20 0.43
CETP P11597 1/20 0.43
HTT P42858 1/20 0.43
UBE2N P61088 1/20 0.43
SMPD1 P17405 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12808886 1.00 GPR84 (0.46) GPR84SPHK1FFAR1LMNAZDHHC7
SCHEMBL9840013 1.00 GPR84 (0.46) GPR84SPHK1FFAR1LMNAZDHHC7
SCHEMBL5452626 1.00 GPR84 (0.46) GPR84SPHK1FFAR1LMNAZDHHC7
SCHEMBL9839941 1.00 GPR84 (0.46) GPR84SPHK1FFAR1LMNAZDHHC7
SCHEMBL39291 1.00 GPR84 (0.46) GPR84SPHK1FFAR1LMNAZDHHC7
SCHEMBL11188740 1.00 GPR84 (0.46) GPR84SPHK1FFAR1LMNAZDHHC7
SCHEMBL3380923 0.97
SCHEMBL988191 0.90
SCHEMBL13717637 0.90
SCHEMBL8442881 0.89 TRPV1 (0.38) GPR84SPHK1FFAR1LMNAZDHHC7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4504740-A1 POLYOXOMETALATES FOR THE PREPARATION OF OPTICAL METAL OXIDE LAYERS Merck Patent GmbH (DE) 2025-02-12 EP disclosed
US-20250042761-A1 POLYOXOMETALATES FOR THE PREPARATION OF OPTICAL METAL OXIDE LAYERS MERCK ELECTRONICS KGAA (DE) 2025-02-06 US disclosed
US-12034122-B2 Electrolytic solution for lithium-ion secondary battery and lithium-ion secondary battery MURATA MANUFACTURING CO., LTD. (JP) 2024-07-09 US disclosed
CN-112074983-B Electrolyte for lithium ion secondary battery and lithium ion secondary battery 株式会社村田制作所 2024-06-04 CN disclosed
CN-113574041-B Bisphenol production method and polycarbonate resin production method 三菱化学株式会社 2023-10-13 CN disclosed
WO-2023194419-A1 POLYOXOMETALATES FOR THE PREPARATION OF OPTICAL METAL OXIDE LAYERS MERCK PATENT GMBH (DE) 2023-10-12 WO disclosed
CN-113574041-A Method for producing bisphenol and method for producing polycarbonate resin 三菱化学株式会社 2021-10-29 CN disclosed
EP-3806220-A1 ELECTROLYTE FOR LITHIUM-ION SECONDARY CELL, AND LITHIUM-ION SECONDARY CELL Murata Manufacturing Co., Ltd. (JP) 2021-04-14 EP disclosed
US-20210066756-A1 ELECTROLYTIC SOLUTION FOR LITHIUM-ION SECONDARY BATTERY AND LITHIUM-ION SECONDARY BATTERY MURATA MANUFACTURING CO., LTD. (JP) 2021-03-04 US disclosed
CN-112074983-A Electrolyte for lithium ion secondary battery and lithium ion secondary battery 株式会社村田制作所 2020-12-11 CN disclosed
WO-2020189201-A1 METHOD FOR PRODUCING BISPHENOL AND METHOD FOR PRODUCING POLYCARBONATE RESIN 三菱ケミカル株式会社 2020-09-24 WO disclosed