⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22471779 | 0.78 | ALDH1A1 (0.31) | — | |
| SCHEMBL1047285 | 0.76 | TSHR (0.35) | — | |
| SCHEMBL21808442 | 0.73 | TSHR (0.33) | — | |
| SCHEMBL27487453 | 0.68 | GAA (0.33) | — | |
| SCHEMBL27945465 | 0.68 | CYP2C19 (0.32) | — | |
| SCHEMBL25701767 | 0.68 | TSHR (0.43) | — | |
| SCHEMBL21693914 | 0.66 | — | — | |
| SCHEMBL2202765 | 0.66 | TSHR (0.30) | — | |
| SCHEMBL1254958 | 0.66 | — | — | |
| SCHEMBL25701770 | 0.65 | SMN1; SMN2 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020196139-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, METHOD FOR PRODUCING HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT | 東レ株式会社 | 2020-10-01 | — | — | WO | disclosed |
| CN-110419001-A | Photosensitive polymer combination, photosensitive polymer combination film, insulating film and electronic component | TORAY INDUSTRIES | 2019-11-05 | — | — | CN | disclosed |
| CN-110016170-A | A kind of low water vapor transmittance polyolefin elastomer glue film and preparation method | 杭州福斯特应用材料股份有限公司 | 2019-07-16 | — | — | CN | disclosed |
| CN-109906217-A | Diamine compound, heat-resistant resin and resin combination using it | 东丽株式会社 | 2019-06-18 | — | — | CN | disclosed |
| CN-105960441-B | It is used to form the coating composition of the film with impact resistance | 关西涂料株式会社 | 2019-04-16 | — | — | CN | disclosed |
| CN-109313387-A | Photosensitive polymer combination | 东丽株式会社 | 2019-02-05 | — | — | CN | disclosed |
| CN-108137805-A | Resin and photosensitive polymer combination | 东丽株式会社 | 2018-06-08 | — | — | CN | disclosed |
| CN-101142529-B | Photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2012-02-22 | — | — | CN | disclosed |