SCHEMBL224821

SCHEMBL224821

C=C(C)C(=O)Nc1ccccc1O

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 5/20 0.56
KMT2A Q03164 3/20 0.56
KDM4E B2RXH2 3/20 0.56
MAPT P10636 3/20 0.56
TDP1 Q9NUW8 2/20 0.56
NPC1 O15118 5/20 0.52
RAB9A P51151 4/20 0.52
LMNA P02545 4/20 0.52
HTT P42858 3/20 0.52
TP53 P04637 2/20 0.52
MEN1 O00255 2/20 0.47
HPGD P15428 4/20 0.46
ALDH1A1 P00352 3/20 0.46
MAPK1 P28482 2/20 0.46
HSD17B10 Q99714 1/20 0.46
TSHR P16473 1/20 0.45
NFKB1 P19838 1/20 0.45
NFKB2 Q00653 1/20 0.45
RELA Q04206 1/20 0.45
METAP2 P50579 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29366694 1.00 GAA (0.56) GAAKMT2AKDM4EMAPTTDP1
SCHEMBL6418936 0.88 NPC1 (0.59) GAAKDM4EMAPTTDP1NPC1
SCHEMBL1549839 0.83 NPC1 (0.63) GAAKMT2AKDM4EMAPTTDP1
SCHEMBL29473469 0.83 NPC1 (0.63) GAAKMT2AKDM4EMAPTTDP1
SCHEMBL959541 0.82 NPC1 (0.77) GAAKDM4EMAPTTDP1NPC1
SCHEMBL31598556 0.82 GAA (0.53) GAAKMT2AKDM4EMAPTTDP1
SCHEMBL14390541 0.82 NPC1 (0.53) GAAKMT2AKDM4EMAPTTDP1
SCHEMBL9359137 0.82 TRPV1 (0.52) GAAKMT2AKDM4EMAPTTDP1
SCHEMBL10040372 0.81 TDP1 (0.44) GAAKMT2AKDM4EMAPTTDP1
SCHEMBL28157494 0.81 NPC1 (0.52) GAAKMT2AKDM4EMAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1074 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024024502-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2024-02-01 WO claimed
CN-116848466-A Positive photosensitive resin composition 日产化学株式会社 2023-10-03 CN claimed
WO-2022168732-A1 POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2022-08-11 WO claimed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US claimed
EP-1562542-A1 PERFUME POLYMERIC PARTICLES THE PROCTER & GAMBLE COMPANY (US) 2005-08-17 EP claimed
EP-1038668-B1 Photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO LTD (JP) 2005-05-25 EP claimed
EP-0914964-B1 Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO LTD (JP) 2004-12-29 EP claimed
WO-2004041232-A1 PERFUME POLYMERIC PARTICLES THE PROCTER & GAMBLE COMPANY (US) 2004-05-21 WO claimed
EP-1019090-B1 POLYMERIC DERIVATIVES OF CAMPTOTHECINS PHARMACIA ITALIA SPA (IT) 2004-02-18 EP claimed
US-6355396-B1 HIGH SENSITIVITY AND GOOD LATITUDE IN DEVELOPMENT, FOR PRODUCING DIRECT PLATE PRODUCTION PROCESS AND ENABLES AN IMAGE TO BE FORMED WITH HIGH SENSITIVITY WITH AN INFRARED LASER FUJI PHOTO FILM CO., LTD. (JP) 2002-03-12 US claimed
US-6132929-A Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US claimed
EP-1038668-A2 Photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO., LTD. (JP) 2000-09-27 EP claimed
EP-0914964-A2 Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO., LTD. (JP) 1999-05-12 EP claimed
US-5698361-A DIAZONIUM COMPOUND, POLYMERIC BINDER; DURABILITY FUJI PHOTO FILM CO., LTD. (JP) 1997-12-16 US claimed
US-5306774-A Protective coating EASTMAN KODAK COMPANY (US) 1994-04-26 US claimed
US-5250626-A Miscible blends of polyphosphazenes and acidic functional polymers EASTMAN KODAK COMPANY (US) 1993-10-05 US claimed
EP-0545397-A1 Miscible blends of poly (alkylene oxide) vinyl carboxylic ester polymers and acidic functional polymers EASTMAN CHEMICAL COMPANY (US) 1993-06-09 EP claimed
EP-0335785-B1 HYDROGEL-TYPE POLYMER SUPPORTS WITH RELEASABLE ACTIVE AGENTS, CORRESPONDING COMPOSITIONS, AND A PROCESS FOR THEIR PREPARATION ESSILOR INTERNATIONAL Compagnie Générale d'Optique (FR) 1992-01-22 EP claimed
EP-0184044-B1 LIGHT-SENSITIVE COMPOSITION, REGISTRATION MATERIAL PREPARED THEREOF, AND PROCESS FOR OBTAINING HEAT-RESISTANT RELIEF IMAGES HOECHST AKTIENGESELLSCHAFT (DE) 1992-01-15 EP claimed
US-4699867-A Radiation-sensitive positive working composition and material with aqueous-alkaline soluble acryamide or methacryamide copolymer having hydroxyl or carboxyl groups HOECHST AKTIENGESELLSCHAFT (DE) 1987-10-13 US claimed