SCHEMBL22493543

SCHEMBL22493543

C=CCCC(=O)Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11067606 0.83
SCHEMBL22493561 0.79 MAPT (0.64)
SCHEMBL22493554 0.79 MAPT (0.64)
SCHEMBL22493545 0.79 MAPT (0.64)
SCHEMBL22493539 0.79 MAPT (0.64)
SCHEMBL22493538 0.79 MAPT (0.64)
SCHEMBL3624486 0.79 MAPT (0.64)
SCHEMBL296964 0.75 MAPT (0.46)
SCHEMBL3990570 0.75
SCHEMBL5092647 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107011136-B Synthesis method of trans-4-decenal 云南博淇科技有限公司 2023-03-03 CN disclosed
CN-107011136-B Synthesis method of trans-4-decenal 云南博淇科技有限公司 2023-03-03 CN disclosed
US-11111348-B2 Method for treating surface of resin material layer and resin material MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2021-09-07 US disclosed
EP-3450488-B1 METHOD FOR TREATING SURFACE OF RESIN MATERIAL LAYER AND RESIN MATERIAL MITSUBISHI HEAVY IND LTD (JP) 2021-03-24 EP disclosed
US-20200317876-A1 METHOD FOR TREATING SURFACE OF RESIN MATERIAL LAYER AND RESIN MATERIAL MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2020-10-08 US disclosed