SCHEMBL22493938

SCHEMBL22493938

c1ccc2c(c1)-c1ccccc1C21c2ccc(OCC3CO3)cc2Oc2cc(OCC3CO3)ccc21

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.50
TP53 P04637 3/20 0.50
TSHR P16473 3/20 0.50
CYP3A4 P08684 2/20 0.50
HIF1A Q16665 2/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
TDP1 Q9NUW8 1/20 0.48
MEN1 O00255 4/20 0.42
KMT2A Q03164 4/20 0.42
FGFR1 P11362 1/20 0.41
SRC P12931 1/20 0.41
MAPT P10636 4/20 0.40
HPGD P15428 2/20 0.40
LMNA P02545 2/20 0.40
PKM P14618 2/20 0.40
CYP1A2 P05177 1/20 0.40
PPARG P37231 1/20 0.40
GAA P10253 1/20 0.40
PDK2 Q15119 6/20 0.39
GLA P06280 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30621812 1.00 ALDH1A1 (0.50) ALDH1A1TP53TSHRCYP3A4HIF1A
SCHEMBL15829484 0.87 ALDH1A1 (0.55) ALDH1A1TP53TSHRCYP3A4HIF1A
SCHEMBL20590534 0.81 ALDH1A1 (0.47) ALDH1A1TP53TSHRCYP3A4HIF1A
SCHEMBL30275957 0.80 ALDH1A1 (0.51) ALDH1A1TP53TSHRCYP3A4HIF1A
SCHEMBL14672967 0.80 ALDH1A1 (0.51) ALDH1A1TP53TSHRCYP3A4HIF1A
SCHEMBL13827403 0.80 TDP1 (0.58) ALDH1A1TP53TSHRCYP3A4HIF1A
SCHEMBL157321 0.80 TDP1 (0.58) ALDH1A1TP53TSHRCYP3A4HIF1A
SCHEMBL15700021 0.80 TDP1 (0.58) ALDH1A1TP53TSHRCYP3A4HIF1A
SCHEMBL30044297 0.80 TDP1 (0.58) ALDH1A1TP53TSHRCYP3A4HIF1A
SCHEMBL3274168 0.80 ALDH1A1 (0.53) ALDH1A1TP53TSHRCYP3A4HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025127129-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM 日産化学株式会社 2025-06-19 WO disclosed
WO-2023182408-A1 COMPOSITION FOR FORMING RESIST-LOWER-LAYER FILM INCLUDING FLUORENE SKELETON 日産化学株式会社 2023-09-28 WO disclosed
WO-2023148123-A1 COMPOSITION, CURED FILM, DEVICE INCLUDING THE SAME, AND MANUFACTURING METHOD FOR THE CURED FILM MERCK PATENT GMBH (DE) 2023-08-10 WO disclosed
US-20200319549-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT HAVING CURED FILM, ORGANIC EL DISPLAY, AND METHOD FOR MANUFACTURING ORGANIC EL DISPLAY TORAY INDUSTRIES, INC. (JP) 2020-10-08 US disclosed