SCHEMBL22497434

SCHEMBL22497434

CCCCC1(CCCC)c2cc(C(CCC3CCCCC3)=NOC(C)=O)ccc2-c2ccc([N+](=O)[O-])cc21

nearest known ligand 0.46

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 4/20 0.46
▸ ALDH1A1 P00352 7/20 0.44
▸ KMT2A Q03164 4/20 0.44
▸ MEN1 O00255 3/20 0.44
▸ SMN1; SMN2 Q16637 2/20 0.35
▸ TDP1 Q9NUW8 1/20 0.35
▸ GAA P10253 1/20 0.34
▸ L3MBTL1 Q9Y468 2/20 0.34
▸ POLB P06746 1/20 0.33
▸ ATM Q13315 1/20 0.33
▸ CYP19A1 P11511 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31747787 1.00 MAPT (0.46) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL25911822 0.95 MAPT (0.47) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
Acetic Acid SCHEMBL22497435 0.89 MAPT (0.41) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
Acetic Acid SCHEMBL22497433 0.89 MAPT (0.41) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
Acetic Acid SCHEMBL29503051 0.89 MAPT (0.41) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL25911865 0.88 MAPT (0.55) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL24858669 0.87 MEN1 (0.39) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL18012789 0.86 ATM (0.38) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL28704196 0.85 MAPT (0.43) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL18012700 0.83 HDAC3 (0.35) MAPTALDH1A1KMT2AMEN1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114326299-A Photosensitive resin composition, optical filter and application 常州强力电子新材料股份有限公司 2022-04-12 — — CN claimed
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN claimed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN claimed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN claimed
CN-111752096-B Photosensitive resin composition for color filter and color filter 常州正洁智造科技有限公司 2022-10-14 — — CN disclosed
CN-115128899-A Photosensitive resin composition with improved system hue stability 常州正洁智造科技有限公司 2022-09-30 — — CN disclosed
CN-111752091-B Application of HABI mixed photoinitiator in UVLED photocuring 常州正洁智造科技有限公司 2022-09-06 — — CN disclosed
CN-112835261-B EO/PO modified 9-phenylacridine photosensitizer and application thereof 常州强力电子新材料股份有限公司 2022-06-07 — — CN disclosed
CN-114326299-A Photosensitive resin composition, optical filter and application 常州强力电子新材料股份有限公司 2022-04-12 — — CN disclosed
CN-114326309-A Photosensitive resin composition and application thereof 常州正洁智造科技有限公司 2022-04-12 — — CN disclosed
CN-113929624-A Pyrazoline compound, photosensitive resin composition and patterning method 常州强力电子新材料股份有限公司 2022-01-14 — — CN disclosed
WO-2021213087-A1 ETHOXY/PROPOXY MODIFIED PYRAZOLINE ORGANIC MATTER, APPLICATION THEREOF, PHOTOCURABLE COMPOSITION, AND PHOTORESIST 常州强力电子新材料股份有限公司 (CN) 2021-10-28 — — WO disclosed
CN-111747897-A Hexaarylbisimidazole photoinitiator and application thereof 常州格林感光新材料有限公司 2020-10-09 — — CN disclosed
CN-111752091-A Application of HABI mixed photoinitiator in UVLED photocuring 常州格林感光新材料有限公司 2020-10-09 — — CN disclosed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN disclosed
CN-111752096-A Photosensitive resin composition for color filter and color filter 常州格林感光新材料有限公司 2020-10-09 — — CN disclosed
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN disclosed
WO-2020200020-A1 HEXAARYLBIIMIDAZOLE PHOTOINITIATOR AND APPLICATION THEREOF 常州格林感光新材料有限公司 2020-10-08 — — WO disclosed
CN-111258180-A Hexaarylbisimidazole mixed photoinitiator and application thereof 常州格林感光新材料有限公司 2020-06-09 — — CN disclosed
CN-111258181-A Hexaarylbisimidazole mixed photoinitiator 常州格林感光新材料有限公司 2020-06-09 — — CN disclosed
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