Acetic Acid

Acetic Acid

SCHEMBL22497435

CC(=O)O.CCCCC1(CCCC)c2cc(C(CCC3CCCCC3)=NO)ccc2-c2ccc([N+](=O)[O-])cc21

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 4/20 0.41
▸ ALDH1A1 P00352 5/20 0.40
▸ KMT2A Q03164 3/20 0.40
▸ MEN1 O00255 2/20 0.40
▸ GAA P10253 1/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.36
▸ TDP1 Q9NUW8 1/20 0.36
▸ TBXA2R P21731 3/20 0.34
▸ SLC6A2 P23975 1/20 0.34
▸ SLC6A4 P31645 1/20 0.34
▸ DRD3 P35462 1/20 0.34
▸ POLB P06746 1/20 0.34
▸ ATM Q13315 1/20 0.34
▸ CYP19A1 P11511 1/20 0.33
▸ LMNA P02545 1/20 0.33
▸ CNR1 P21554 1/20 0.33
▸ HTT P42858 1/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33
▸ GPR55 Q9Y2T6 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL22497433 1.00 MAPT (0.41) MAPTALDH1A1KMT2AMEN1GAA
Acetic Acid SCHEMBL29503051 1.00 MAPT (0.41) MAPTALDH1A1KMT2AMEN1GAA
SCHEMBL22497434 0.89 MAPT (0.46) MAPTALDH1A1KMT2AMEN1GAA
SCHEMBL31747787 0.89 MAPT (0.46) MAPTALDH1A1KMT2AMEN1GAA
SCHEMBL28704196 0.87 MAPT (0.43) MAPTALDH1A1KMT2AMEN1GAA
SCHEMBL25911822 0.83 MAPT (0.47) MAPTALDH1A1KMT2AMEN1GAA
SCHEMBL25911865 0.81 MAPT (0.55) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL18012752 0.79 ESPL1 (0.38) MAPTALDH1A1KMT2AMEN1GAA
SCHEMBL16550544 0.78 ESPL1 (0.41) MAPTALDH1A1KMT2AMEN1GAA
SCHEMBL16550542 0.78 ESPL1 (0.41) MAPTALDH1A1KMT2AMEN1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114326299-A Photosensitive resin composition, optical filter and application 常州强力电子新材料股份有限公司 2022-04-12 — — CN claimed
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN claimed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN claimed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN claimed
CN-111752096-B Photosensitive resin composition for color filter and color filter 常州正洁智造科技有限公司 2022-10-14 — — CN disclosed
CN-115128899-A Photosensitive resin composition with improved system hue stability 常州正洁智造科技有限公司 2022-09-30 — — CN disclosed
CN-111752091-B Application of HABI mixed photoinitiator in UVLED photocuring 常州正洁智造科技有限公司 2022-09-06 — — CN disclosed
CN-112835261-B EO/PO modified 9-phenylacridine photosensitizer and application thereof 常州强力电子新材料股份有限公司 2022-06-07 — — CN disclosed
CN-114326299-A Photosensitive resin composition, optical filter and application 常州强力电子新材料股份有限公司 2022-04-12 — — CN disclosed
CN-114326309-A Photosensitive resin composition and application thereof 常州正洁智造科技有限公司 2022-04-12 — — CN disclosed
CN-113929624-A Pyrazoline compound, photosensitive resin composition and patterning method 常州强力电子新材料股份有限公司 2022-01-14 — — CN disclosed
WO-2021213087-A1 ETHOXY/PROPOXY MODIFIED PYRAZOLINE ORGANIC MATTER, APPLICATION THEREOF, PHOTOCURABLE COMPOSITION, AND PHOTORESIST 常州强力电子新材料股份有限公司 (CN) 2021-10-28 — — WO disclosed
CN-111747897-A Hexaarylbisimidazole photoinitiator and application thereof 常州格林感光新材料有限公司 2020-10-09 — — CN disclosed
CN-111752091-A Application of HABI mixed photoinitiator in UVLED photocuring 常州格林感光新材料有限公司 2020-10-09 — — CN disclosed
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN disclosed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN disclosed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 — — CN disclosed
WO-2020200020-A1 HEXAARYLBIIMIDAZOLE PHOTOINITIATOR AND APPLICATION THEREOF 常州格林感光新材料有限公司 2020-10-08 — — WO disclosed
CN-111258180-A Hexaarylbisimidazole mixed photoinitiator and application thereof 常州格林感光新材料有限公司 2020-06-09 — — CN disclosed
CN-111258181-A Hexaarylbisimidazole mixed photoinitiator 常州格林感光新材料有限公司 2020-06-09 — — CN disclosed
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