SCHEMBL22503186

SCHEMBL22503186

O=C(NS(=O)(=O)C(F)(F)F)c1ccc(F)c(F)c1F

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ CES2 O00748 2/20 0.48
▸ CES1 P23141 2/20 0.48
▸ FLT1 P17948 5/20 0.38
▸ FLT4 P35916 5/20 0.38
▸ KDR P35968 5/20 0.38
▸ HPGD P15428 1/20 0.37
▸ KAT6A Q92794 2/20 0.36
▸ SCN9A Q15858 2/20 0.35
▸ SCN5A Q14524 1/20 0.35
▸ MAPK1 P28482 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ CCR2 P41597 1/20 0.34
▸ CA2 P00918 2/20 0.34
▸ POLB P06746 1/20 0.34
▸ LTB4R Q15722 3/20 0.33
▸ CA12 O43570 1/20 0.33
▸ CA1 P00915 1/20 0.33
▸ CA9 Q16790 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503329 0.83 SMN1; SMN2 (0.43) CES2CES1FLT1FLT4KDR
SCHEMBL22503182 0.81 CES2 (0.36) CES2CES1HPGDSCN9ASCN5A
SCHEMBL22503209 0.79 CES2 (0.50) CES2CES1FLT1FLT4KDR
SCHEMBL26163054 0.78 HPGD (0.61) CES2CES1HPGDKAT6ASMN1; SMN2
SCHEMBL26163064 0.76 KAT6A (0.39) HPGDKAT6ASMN1; SMN2CCR2POLB
SCHEMBL22503183 0.75 CES2 (0.50) CES2CES1FLT1FLT4KDR
SCHEMBL22503113 0.74 FLT1 (0.61) FLT1FLT4KDR
SCHEMBL22503305 0.73 CES2 (0.48) CES2CES1SCN9ASCN5A
SCHEMBL26163061 0.73 HPGD (0.44) CES2CES1HPGDKAT6ASCN9A
SCHEMBL26163068 0.73 HPGD (0.44) HPGDKAT6ASMN1; SMN2CCR2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 — — US disclosed
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