SCHEMBL22503294

SCHEMBL22503294

O=C(CCl)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.42
CA2 P00918 3/20 0.42
EPHX1 P07099 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.34
ALDH1A1 P00352 1/20 0.34
PRMT1 Q99873 1/20 0.33
MMP2 P08253 3/20 0.33
MMP9 P14780 3/20 0.33
MMP12 P39900 2/20 0.33
GSTO1 P78417 2/20 0.33
MAPK1 P28482 1/20 0.32
MMP1 P03956 1/20 0.32
MMP8 P22894 1/20 0.32
MMP13 P45452 1/20 0.32
AR P10275 1/20 0.31
PTGS1 P23219 1/20 0.31
AKR1C3 P42330 1/20 0.31
AKR1C2 P52895 1/20 0.31
PPARA Q07869 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27552476 0.79 CA1 (0.44) CA1CA2EPHX1SMN1; SMN2MMP2
SCHEMBL22503265 0.77 CA1 (0.42) CA1CA2EPHX1SMN1; SMN2MMP2
SCHEMBL26163088 0.77 CA1 (0.42) CA1CA2EPHX1SMN1; SMN2MMP2
SCHEMBL10076880 0.77 CA1 (0.42) CA1CA2EPHX1SMN1; SMN2ALDH1A1
SCHEMBL3928422 0.77 CA2 (0.42) CA1CA2EPHX1SMN1; SMN2MMP2
SCHEMBL8341773 0.76 CA1 (0.41) CA1CA2EPHX1SMN1; SMN2MMP2
SCHEMBL22503267 0.76 CA1 (0.41) CA1CA2EPHX1SMN1; SMN2MMP2
SCHEMBL22503096 0.75 CA1 (0.37) CA1CA2EPHX1SMN1; SMN2MMP2
SCHEMBL22503212 0.74 PHF8 (0.43) CA1CA2ALDH1A1
SCHEMBL18969615 0.74 CA1 (0.44) CA1CA2EPHX1SMN1; SMN2MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed