Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.59 |
| ▸ | THRB | P10828 | 1/20 | 0.59 |
| ▸ | HTT | P42858 | 1/20 | 0.59 |
| ▸ | MAPT | P10636 | 1/20 | 0.59 |
| ▸ | TSHR | P16473 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 3/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | USP2 | O75604 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.41 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.41 |
| ▸ | FAAH | O00519 | 5/20 | 0.37 |
| ▸ | CNR1 | P21554 | 1/20 | 0.36 |
| ▸ | CNR2 | P34972 | 1/20 | 0.36 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetraethylene Glycol SCHEMBL2263658 | 1.00 | MEN1 (0.59) | MEN1KMT2ATHRBHTTMAPT | |
| Triethylene Glycol SCHEMBL25256580 | 0.98 | MEN1 (0.62) | MEN1KMT2ATHRBHTTMAPT | |
| Triethylene Glycol SCHEMBL25300993 | 0.98 | MEN1 (0.62) | MEN1KMT2ATHRBHTTMAPT | |
| Di(Hydroxyethyl)Ether SCHEMBL2266294 | 0.98 | TSHR (0.56) | MEN1KMT2ATHRBHTTMAPT | |
| Triethylene Glycol SCHEMBL7934388 | 0.94 | TSHR (0.56) | MEN1KMT2ATHRBHTTMAPT | |
| Di(Hydroxyethyl)Ether SCHEMBL9769502 | 0.92 | TSHR (0.58) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL2263661 | 0.87 | MEN1 (0.57) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL2264265 | 0.87 | MEN1 (0.57) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL29521238 | 0.87 | MEN1 (0.57) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL29908275 | 0.87 | MEN1 (0.57) | MEN1KMT2ATHRBHTTMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113169248-B | Method for manufacturing semiconductor element and method for manufacturing solar cell | 东丽株式会社 | 2024-10-01 | — | — | CN | disclosed |
| US-20230231198-A1 | SECONDARY BATTERY | MURATA MANUFACTURING CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| WO-2022208663-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION | 昭和電工マテリアルズ株式会社 | 2022-10-06 | — | — | WO | disclosed |
| US-20220187517-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND WAVELENGTH CONVERSION RESIN COMPOSITION | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2022-06-16 | — | — | US | disclosed |
| CN-113557610-A | Wavelength conversion member, backlight unit, image display device, and resin composition for wavelength conversion | 昭和电工材料株式会社 | 2021-10-26 | — | — | CN | disclosed |
| US-20210292643-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, RESIN COMPOSITION FOR WAVELENGTH CONVERSION, AND RESIN CURED PRODUCT FOR WAVELENGTH CONVERSION | SHOWA DENKO MATERIALS CO LTD (JP) | 2021-09-23 | — | — | US | disclosed |
| US-11061278-B2 | Wavelength conversion member, back light unit, image display device, resin composition for wavelength conversion, and resin cured product for wavelength conversion | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-20210139769-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, CURABLE COMPOSITION AND CURED PRODUCT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| US-20210139768-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| WO-2021084603-A1 | RESIN COMPOSITION FOR WAVELENGTH CONVERSION, CURED RESIN MATERIAL FOR WAVELENGTH CONVERSION, WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT AND IMAGE DISPLAY DEVICE | 昭和電工マテリアルズ株式会社 | 2021-05-06 | — | — | WO | disclosed |
| US-20140227821-A1 | P-TYPE DIFFUSION LAYER FORMING COMPOSITION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-08-14 | — | — | US | disclosed |
| EP-2743967-A1 | COMPOSITION THAT FORMS N-TYPE DIFFUSION LAYER, N-TYPE DIFFUSION LAYER MANUFACTURING METHOD AND SOLAR CELL ELEMENT MANUFACTURING METHOD | Hitachi Chemical Company, Ltd. (JP) | 2014-06-18 | — | — | EP | disclosed |
| EP-2728624-A1 | SEMICONDUCTOR SUBSTRATE, MANUFACTURING METHOD THEREFOR, SOLAR-CELL ELEMENT, AND SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2014-05-07 | — | — | EP | disclosed |
| EP-2662883-A1 | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | Hitachi Chemical Company, Ltd. (JP) | 2013-11-13 | — | — | EP | disclosed |
| CN-103155166-A | Method for producing solar cell | HITACHI CHEMICAL CO LTD | 2013-06-12 | — | — | CN | disclosed |
| CN-103155164-A | Method for manufacturing solar cell | HITACHI CHEMICAL CO LTD | 2013-06-12 | — | — | CN | disclosed |
| US-20130025669-A1 | PHOTOVOLTAIC CELL SUBSTRATE, METHOD OF PRODUCING PHOTOVOLTAIC CELL SUBSTRATE, PHOTOVOLTAIC CELL ELEMENT AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2013-01-31 | — | — | US | disclosed |
| US-20110212564-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-09-01 | — | — | US | disclosed |
| US-20110195540-A1 | COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-08-11 | — | — | US | disclosed |
| EP-2355137-A1 | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | Hitachi Chemical Co., Ltd. (JP) | 2011-08-10 | — | — | EP | disclosed |