SCHEMBL22651908

SCHEMBL22651908

c1ccc(Nc2cccc(Nc3ccc4ccccc4c3)c2)cc1

nearest known ligand 0.91

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.91
HSD17B10 Q99714 4/20 0.91
CYP3A4 P08684 4/20 0.91
HPGD P15428 2/20 0.91
MAPT P10636 6/20 0.70
MEN1 O00255 3/20 0.70
KMT2A Q03164 3/20 0.70
AR P10275 1/20 0.70
SNCA P37840 1/20 0.58
ALOX12 P18054 3/20 0.56
L3MBTL1 Q9Y468 3/20 0.56
MAPK1 P28482 2/20 0.56
TSHR P16473 2/20 0.56
TDP1 Q9NUW8 2/20 0.56
ALOX15 P16050 1/20 0.56
PTGS1 P23219 1/20 0.56
SLC6A2 P23975 1/20 0.56
PTGS2 P35354 1/20 0.56
HTR2B P41595 1/20 0.56
NPC1 O15118 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9486049 1.00 ALDH1A1 (0.91) ALDH1A1HSD17B10CYP3A4HPGDMAPT
SCHEMBL7928040 0.96 ALDH1A1 (0.83) ALDH1A1HSD17B10CYP3A4HPGDMAPT
SCHEMBL11466814 0.96 ALDH1A1 (1.00) ALDH1A1HSD17B10CYP3A4HPGDMAPT
Diphenylamine SCHEMBL28300967 0.96 ALDH1A1 (1.00) ALDH1A1HSD17B10CYP3A4HPGDMAPT
SCHEMBL38433 0.96 ALDH1A1 (1.00) ALDH1A1HSD17B10CYP3A4HPGDMAPT
SCHEMBL29354421 0.96 ALDH1A1 (1.00) ALDH1A1HSD17B10CYP3A4HPGDMAPT
Benzene SCHEMBL28342167 0.96 ALDH1A1 (1.00) ALDH1A1HSD17B10CYP3A4HPGDMAPT
SCHEMBL11961726 0.91 ALDH1A1 (0.91) ALDH1A1HSD17B10CYP3A4HPGDMAPT
SCHEMBL9513153 0.91 ALDH1A1 (0.91) ALDH1A1HSD17B10CYP3A4HPGDMAPT
SCHEMBL29352988 0.91 ALDH1A1 (0.91) ALDH1A1HSD17B10CYP3A4HPGDMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11782347-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 US disclosed
US-11709429-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 US disclosed
US-11675268-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-13 US disclosed
US-20210011384-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-14 US disclosed
US-20210003920-A1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-07 US disclosed
US-20200387071-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-10 US disclosed
US-20200363723-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-11-19 US disclosed
US-20200356007-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-11-12 US disclosed