SCHEMBL2267947

SCHEMBL2267947

C=C[Si](C=C)(C=C)N(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL610646 0.75
SCHEMBL21353639 0.75
SCHEMBL2099870 0.75
SCHEMBL25174536 0.73
SCHEMBL610285 0.73
SCHEMBL610974 0.73
SCHEMBL26255374 0.73
SCHEMBL2101418 0.71
SCHEMBL2101445 0.71
SCHEMBL2099382 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12584212-B2 Compositions and methods using same for germanium seed layer VERSUM MATERIALS US, LLC (US) 2026-03-24 US claimed
US-20230287562-A1 COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER VERSUM MATERIALS US, LLC 2023-09-14 US claimed
EP-4176100-A1 COMPOSITIONS AND METHODS USING SAME FOR GERMANIUM SEED LAYER Versum Materials US, LLC (US) 2023-05-10 EP claimed
WO-2022020705-A1 COMPOSITIONS AND METHODS USING SAME FOR GERMANIUM SEED LAYER VERSUM MATERIALS US, LLC (US) 2022-01-27 WO claimed
US-12584212-B2 Compositions and methods using same for germanium seed layer VERSUM MATERIALS US, LLC (US) 2026-03-24 US disclosed
US-20230287562-A1 COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER VERSUM MATERIALS US, LLC 2023-09-14 US disclosed
US-20230287562-A1 COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER VERSUM MATERIALS US, LLC 2023-09-14 US disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed