Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.55 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | FAAH | O00519 | 5/20 | 0.38 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.37 |
| ▸ | CNR1 | P21554 | 1/20 | 0.37 |
| ▸ | CNR2 | P34972 | 1/20 | 0.37 |
| ▸ | GPR84 | Q9NQS5 | 4/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2266461 | 1.00 | TDP1 (0.55) | TDP1MAPTSPHK1HSD17B10FAAH | |
| SCHEMBL2266778 | 1.00 | TDP1 (0.55) | TDP1MAPTSPHK1HSD17B10FAAH | |
| SCHEMBL31680382 | 0.96 | TDP1 (0.53) | TDP1MAPTSPHK1HSD17B10FAAH | |
| SCHEMBL6903969 | 0.94 | TDP1 (0.52) | TDP1MAPTSPHK1HSD17B10FAAH | |
| SCHEMBL7940951 | 0.94 | TDP1 (0.57) | TDP1MAPTSPHK1HSD17B10FAAH | |
| SCHEMBL7943965 | 0.94 | TDP1 (0.57) | TDP1MAPTSPHK1HSD17B10FAAH | |
| SCHEMBL26270570 | 0.94 | TDP1 (0.52) | TDP1MAPTSPHK1HSD17B10FAAH | |
| SCHEMBL7941774 | 0.90 | TDP1 (0.55) | TDP1MAPTSPHK1HSD17B10FAAH | |
| SCHEMBL9296495 | 0.87 | TDP1 (0.50) | TDP1MAPTSPHK1HSD17B10FAAH | |
| SCHEMBL2266774 | 0.86 | TDP1 (0.46) | TDP1MAPTSPHK1HSD17B10FAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113169248-B | Method for manufacturing semiconductor element and method for manufacturing solar cell | 东丽株式会社 | 2024-10-01 | — | — | CN | disclosed |
| WO-2022208663-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION | 昭和電工マテリアルズ株式会社 | 2022-10-06 | — | — | WO | disclosed |
| US-20220187517-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND WAVELENGTH CONVERSION RESIN COMPOSITION | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2022-06-16 | — | — | US | disclosed |
| CN-113557610-A | Wavelength conversion member, backlight unit, image display device, and resin composition for wavelength conversion | 昭和电工材料株式会社 | 2021-10-26 | — | — | CN | disclosed |
| US-20210292643-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, RESIN COMPOSITION FOR WAVELENGTH CONVERSION, AND RESIN CURED PRODUCT FOR WAVELENGTH CONVERSION | SHOWA DENKO MATERIALS CO LTD (JP) | 2021-09-23 | — | — | US | disclosed |
| CN-113169248-A | Method for manufacturing semiconductor element and method for manufacturing solar cell | 东丽株式会社 | 2021-07-23 | — | — | CN | disclosed |
| US-11061278-B2 | Wavelength conversion member, back light unit, image display device, resin composition for wavelength conversion, and resin cured product for wavelength conversion | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-20210139769-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, CURABLE COMPOSITION AND CURED PRODUCT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| US-20210139768-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| WO-2021084603-A1 | RESIN COMPOSITION FOR WAVELENGTH CONVERSION, CURED RESIN MATERIAL FOR WAVELENGTH CONVERSION, WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT AND IMAGE DISPLAY DEVICE | 昭和電工マテリアルズ株式会社 | 2021-05-06 | — | — | WO | disclosed |
| US-8034545-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| US-20110212564-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-09-01 | — | — | US | disclosed |
| US-20110195540-A1 | COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-08-11 | — | — | US | disclosed |
| EP-2355137-A1 | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | Hitachi Chemical Co., Ltd. (JP) | 2011-08-10 | — | — | EP | disclosed |
| US-20090220897-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL CO., LTD. (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7297464-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2007-11-20 | — | — | US | disclosed |
| EP-1672427-A1 | RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE | Hitachi Chemical Co., Ltd. (JP) | 2006-06-21 | — | — | EP | disclosed |
| EP-1672426-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2006-06-21 | — | — | EP | disclosed |
| US-20050266344-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-12-01 | — | — | US | disclosed |
| US-20050239953-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |