⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28233101 | 0.87 | — | — | |
| SCHEMBL2268539 | 0.67 | — | — | |
| SCHEMBL592710 | 0.63 | — | — | |
| Dimethylamine SCHEMBL23327897 | 0.60 | — | — | |
| SCHEMBL5425 | 0.59 | — | — | |
| Methylethylamine SCHEMBL14666 | 0.59 | — | — | |
| SCHEMBL14716928 | 0.59 | CARM1 (0.47) | — | |
| Methylethylamine SCHEMBL20584249 | 0.56 | TP53 (0.42) | — | |
| Methylethylamine SCHEMBL20507023 | 0.56 | — | — | |
| Methylethylamine SCHEMBL21352603 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116761906-A | Selective plasma enhanced atomic layer deposition | 弗萨姆材料美国有限责任公司 | 2023-09-15 | — | — | CN | disclosed |
| CN-105632885-B | The forming method of semiconductor structure | 中芯国际集成电路制造(上海)有限公司 | 2019-01-22 | — | — | CN | disclosed |
| WO-2016081790-A1 | MOISTURE CURABLE COMPOSITIONS | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2016-05-26 | — | — | WO | disclosed |
| US-9315670-B2 | Composition for forming resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| WO-2015031712-A1 | MOISTURE CURABLE COMPOUND WITH AMINO ACIDS | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2015-03-05 | — | — | WO | disclosed |
| US-20140235796-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-21 | — | — | US | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-7842831-B2 | Method for the continuous production of silicon compounds bearing amino groups | WACKER CHEMIE AG (DE) | 2010-11-30 | — | — | US | disclosed |
| CN-100569783-C | The continuous production method that has amino silicon compound | WACKER CHEMIE AG (DE) | 2009-12-16 | — | — | CN | disclosed |
| US-20090253925-A1 | METHOD FOR THE CONTINUOUS PRODUCTION OF SILICON COMPOUNDS BEARING AMINO GROUPS | WACKER CHEMIE AG (DE) | 2009-10-08 | — | — | US | disclosed |
| CN-100516075-C | Method for producing silicon compound having amino group | WACKER CHEMIE GMBH (DE) | 2009-07-22 | — | — | CN | disclosed |
| US-7417160-B2 | Method for the production of silicon compounds carrying amino groups | WACKER CHEMIE AG (DE) | 2008-08-26 | — | — | US | disclosed |
| EP-1831233-B1 | METHOD FOR THE CONTINUOUS PRODUCTION OF SILICON COMPOUNDS CARRYING AMINO GROUPS | WACKER CHEMIE AG (DE) | 2008-04-23 | — | — | EP | disclosed |
| CN-101080414-A | Method for the continuous production of silicon compounds carrying amino groups | WACKER CHEMIE AG (DE) | 2007-11-28 | — | — | CN | disclosed |
| EP-1682558-B1 | METHOD FOR THE PRODUCTION OF SILICON COMPOUNDS CARRYING AMINO GROUPS | WACKER CHEMIE AG (DE) | 2007-09-19 | — | — | EP | disclosed |
| CN-1878780-A | Method for producing silicon compound having amino group | WACKER CHEMIE GMBH (DE) | 2006-12-13 | — | — | CN | disclosed |
| US-20060194976-A1 | METHOD FOR THE PRODUCTION OF SILICON COMPOUNDS CARRYING AMINO GROUPS | WACKER CHEMIE AG (DE) | 2006-08-31 | — | — | US | disclosed |