SCHEMBL2269615

SCHEMBL2269615

CCN[SiH2]C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2101584 0.72
SCHEMBL2101163 0.70
SCHEMBL12228805 0.69
SCHEMBL8952658 0.65
SCHEMBL27967017 0.62
Diethylamine SCHEMBL2339168 0.61
SCHEMBL30443619 0.60
SCHEMBL2270226 0.60
Diethylamine SCHEMBL27543854 0.58
SCHEMBL2357940 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250003063-A1 Particle Coating Apparatus And Method Of Coating Particle SEIKO EPSON CORPORATION (JP) 2025-01-02 US disclosed
US-20250003064-A1 Particle Coating Apparatus And Method Of Coating Particle SEIKO EPSON CORPORATION (JP) 2025-01-02 US disclosed
US-20240183850-A1 REPLICA OF BIOLOGICAL MATERIAL AND METHOD FOR PRODUCING REPLICA OF BIOLOGICAL MATERIAL SEIKO EPSON CORPORATION (JP) 2024-06-06 US disclosed
US-20230279031-A1 N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM GELEST, INC. 2023-09-07 US disclosed
US-11702434-B2 N-alkyl substituted cyclic and oligomeric perhydridosilazanes, methods of preparation thereof, and silicon nitride films formed therefrom GELEST, INC. (US) 2023-07-18 US disclosed
EP-3390410-B1 METHODS OF MAKING HIGH PURITY TRISILYLAMINE NATA SEMICONDUCTOR MAT CO LTD (CN) 2022-02-02 EP disclosed
US-11111256-B2 High purity trisilylamine, methods of making, and use JIANGSU NATA OPTO-ELECTRONIC MATERIALS CO. LTD. (CN) 2021-09-07 US disclosed
CN-108602839-B A process for preparing an organoaminosilane; method for producing silylamines from organoaminosilanes 南大光电半导体材料有限公司 2021-06-29 CN disclosed
EP-3535436-B1 PRECURSORS AND FLOWABLE CVD METHODS FOR MAKING LOW-K FILMS TO FILL SURFACE FEATURES VERSUM MAT US LLC (US) 2021-05-12 EP disclosed
US-10875877-B2 Method for making an organoaminosilane; a method for making a silylamine from the organoaminosilane DOW SILICONES CORPORATION (US) 2020-12-29 US disclosed
EP-3390410-A1 HIGH PURITY TRISILYLAMINE, METHODS OF MAKING, AND USE Dow Corning Corporation (US) 2018-10-24 EP disclosed
EP-3390411-A1 METHOD FOR MAKING AN ORGANOAMINOSILANE; A METHOD FOR MAKING A SILYLAMINE FROM THE ORGANOAMINOSILANE Dow Corning Corporation (US) 2018-10-24 EP disclosed
WO-2017106625-A1 HIGH PURITY TRISILYLAMINE, METHODS OF MAKING, AND USE DOW CORNING CORPORATION (US) 2017-06-22 WO disclosed
WO-2017106632-A1 METHOD FOR MAKING AN ORGANOAMINOSILANE; A METHOD FOR MAKING A SILYLAMINE FROM THE ORGANOAMINOSILANE DOW CORNING CORPORATION (US) 2017-06-22 WO disclosed
US-20160280724-A1 N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM GELEST, INC. 2016-09-29 US disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
EP-0112434-B1 HYDROGEN BEARING SILYL CARBAMATES UNION CARBIDE CORPORATION (US) 1988-08-17 EP disclosed
US-4489191-A BLEND OF POLYSILOXANE, POLYMERIZATION CATALYSTS, AND HYDROXY SCAVENGER GENERAL ELECTRIC COMPANY (US) 1984-12-18 US disclosed
EP-0017734-A1 Curable organopolysiloxane compositions containing carbon black, method for preparing the same and method for curing the compositions SWS Silicones Corporation (US) 1980-10-29 EP disclosed