⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27491537 | 0.91 | — | — | |
| SCHEMBL27630316 | 0.88 | — | — | |
| Butylamine SCHEMBL1536123 | 0.87 | DNM1 (0.42) | — | |
| SCHEMBL12228805 | 0.80 | — | — | |
| SCHEMBL888678 | 0.78 | TSHR (0.45) | — | |
| SCHEMBL17409612 | 0.78 | TSHR (0.45) | — | |
| SCHEMBL18991366 | 0.73 | — | — | |
| SCHEMBL17046176 | 0.73 | — | — | |
| SCHEMBL22342226 | 0.73 | — | — | |
| SCHEMBL20130854 | 0.71 | TSHR (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4241299-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | Versum Materials US, LLC (US) | 2023-09-13 | — | — | EP | claimed |
| EP-4240886-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | Versum Materials US, LLC (US) | 2023-09-13 | — | — | EP | claimed |
| WO-2022119860-A9 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MATERIAL US, LLC (US) | 2023-08-24 | — | — | WO | claimed |
| EP-4013903-A1 | COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON-CONTAINING FILMS | Versum Materials US, LLC (US) | 2022-06-22 | — | — | EP | claimed |
| WO-2022119860-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MATERIAL US, LLC (US) | 2022-06-09 | — | — | WO | claimed |
| WO-2022119865-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | VERSUM MATERIALS US, LLC (US) | 2022-06-09 | — | — | WO | claimed |
| WO-2021050368-A1 | COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON-CONTAINING FILMS | VERSUM MATERIALS US, LLC (US) | 2021-03-18 | — | — | WO | claimed |
| EP-4241299-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | Versum Materials US, LLC (US) | 2023-09-13 | — | — | EP | disclosed |
| EP-4240886-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | Versum Materials US, LLC (US) | 2023-09-13 | — | — | EP | disclosed |
| WO-2022119860-A9 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MATERIAL US, LLC (US) | 2023-08-24 | — | — | WO | disclosed |
| WO-2022119860-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MATERIAL US, LLC (US) | 2022-06-09 | — | — | WO | disclosed |
| WO-2022119865-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | VERSUM MATERIALS US, LLC (US) | 2022-06-09 | — | — | WO | disclosed |
| EP-3390410-B1 | METHODS OF MAKING HIGH PURITY TRISILYLAMINE | NATA SEMICONDUCTOR MAT CO LTD (CN) | 2022-02-02 | — | — | EP | disclosed |
| CN-108602840-A | High-purity trimethylsilyl amine, preparation method and purposes | 美国陶氏有机硅公司 | 2018-09-28 | — | — | CN | disclosed |
| WO-2017106632-A1 | METHOD FOR MAKING AN ORGANOAMINOSILANE; A METHOD FOR MAKING A SILYLAMINE FROM THE ORGANOAMINOSILANE | DOW CORNING CORPORATION (US) | 2017-06-22 | — | — | WO | disclosed |
| WO-2017106625-A1 | HIGH PURITY TRISILYLAMINE, METHODS OF MAKING, AND USE | DOW CORNING CORPORATION (US) | 2017-06-22 | — | — | WO | disclosed |
| CN-101094888-B | Reactive Silicic Acid Suspension | WACKER CHEMIE AG | 2011-05-04 | — | — | CN | disclosed |
| CN-101094888-A | Reactive Silicic Acid Suspension | WACKER CHEMIE AG (DE) | 2007-12-26 | — | — | CN | disclosed |
| US-5576247-A | ATTACHING HYDROPHOBIC ORGANIC GROUPS TO BORON-PHOSPHOROUS-SILICA LAYER TO PROVIDE MOISTURE BARRIER, REACTION WITH HEXAMETHYDISILAZANE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| EP-0017734-A1 | Curable organopolysiloxane compositions containing carbon black, method for preparing the same and method for curing the compositions | SWS Silicones Corporation (US) | 1980-10-29 | — | — | EP | disclosed |