SCHEMBL2269705

SCHEMBL2269705

CC(C)[SiH](Cl)C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2268474 0.69
SCHEMBL38659527 0.67
SCHEMBL707894 0.62
SCHEMBL301943 0.62
2,2,3-Trimethylbutane SCHEMBL8037906 0.62 ALDH1A1 (0.31)
SCHEMBL1828585 0.59
SCHEMBL1289378 0.59 TSHR (0.33)
SCHEMBL296389 0.59
SCHEMBL2268809 0.59
SCHEMBL23701017 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11807758-B2 Siloxane polymer and method of producing siloxane polymer JNC CORPORATION (JP) 2023-11-07 US disclosed
US-20210238419-A1 SILOXANE POLYMER AND METHOD OF PRODUCING SILOXANE POLYMER JNC CORPORATION (JP) 2021-08-05 US disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed