SCHEMBL2270649

SCHEMBL2270649

CCCC(C)OCC(C)OCC(C)OCC(C)O

nearest known ligand 0.61

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.61
HSD17B10 Q99714 1/20 0.43
MAPK1 P28482 1/20 0.34
TSHR P16473 2/20 0.33
MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2267733 1.00 TDP1 (0.61) TDP1HSD17B10MAPK1TSHRMAPT
SCHEMBL2265097 1.00 TDP1 (0.61) TDP1HSD17B10MAPK1TSHRMAPT
SCHEMBL8336558 0.95 TDP1 (0.59) TDP1HSD17B10MAPK1TSHRMAPT
SCHEMBL16933815 0.88 TDP1 (0.53) TDP1HSD17B10MAPK1TSHRMAPT
SCHEMBL7940951 0.87 TDP1 (0.57) TDP1HSD17B10MAPK1TSHRMAPT
SCHEMBL7943965 0.87 TDP1 (0.57) TDP1HSD17B10MAPK1TSHRMAPT
SCHEMBL2268828 0.85 TDP1 (0.55) TDP1HSD17B10MAPT
SCHEMBL2266778 0.85 TDP1 (0.55) TDP1HSD17B10MAPT
SCHEMBL2266461 0.85 TDP1 (0.55) TDP1HSD17B10MAPT
SCHEMBL2270646 0.85 TDP1 (0.50) TDP1HSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113169248-B Method for manufacturing semiconductor element and method for manufacturing solar cell 东丽株式会社 2024-10-01 CN disclosed
WO-2022208663-A1 WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION 昭和電工マテリアルズ株式会社 2022-10-06 WO disclosed
US-20220187517-A1 WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND WAVELENGTH CONVERSION RESIN COMPOSITION SHOWA DENKO MATERIALS CO., LTD. (JP) 2022-06-16 US disclosed
CN-113557610-A Wavelength conversion member, backlight unit, image display device, and resin composition for wavelength conversion 昭和电工材料株式会社 2021-10-26 CN disclosed
US-20210292643-A1 WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, RESIN COMPOSITION FOR WAVELENGTH CONVERSION, AND RESIN CURED PRODUCT FOR WAVELENGTH CONVERSION SHOWA DENKO MATERIALS CO LTD (JP) 2021-09-23 US disclosed
CN-113169248-A Method for manufacturing semiconductor element and method for manufacturing solar cell 东丽株式会社 2021-07-23 CN disclosed
US-11061278-B2 Wavelength conversion member, back light unit, image display device, resin composition for wavelength conversion, and resin cured product for wavelength conversion SHOWA DENKO MATERIALS CO., LTD. (JP) 2021-07-13 US disclosed
US-20210139769-A1 WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, CURABLE COMPOSITION AND CURED PRODUCT HITACHI CHEMICAL COMPANY, LTD. (JP) 2021-05-13 US disclosed
US-20210139768-A1 WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION HITACHI CHEMICAL COMPANY, LTD. (JP) 2021-05-13 US disclosed
US-20210040383-A1 WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE AND CURABLE COMPOSITION HITACHI CHEMICAL COMPANY, LTD. (JP) 2021-02-11 US disclosed
US-20090220897-A1 RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE HITACHI CHEMICAL CO., LTD. (JP) 2009-09-03 US disclosed
US-7297464-B2 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide HITACHI CHEMICAL CO., LTD. (JP) 2007-11-20 US disclosed
EP-1672427-A1 RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE Hitachi Chemical Co., Ltd. (JP) 2006-06-21 EP disclosed
EP-1672426-A1 RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE HITACHI CHEMICAL COMPANY, LTD. (JP) 2006-06-21 EP disclosed
US-20050266344-A1 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide HITACHI CHEMICAL CO., LTD. (JP) 2005-12-01 US disclosed
US-20050239953-A1 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide HITACHI CHEMICAL CO., LTD. (JP) 2005-10-27 US disclosed
EP-0896610-A4 TWO-COMPONENT CHEMILUMINESCENT COMPOSITION JAME FINE CHEMICALS INC (US) 1999-07-21 EP disclosed
EP-0896610-A1 TWO-COMPONENT CHEMILUMINESCENT COMPOSITION Jame Fine Chemicals, Inc. (US) 1999-02-17 EP disclosed
WO-1997041187-A1 TWO-COMPONENT CHEMILUMINESCENT COMPOSITION JAME FINE CHEMICALS, INC. (US) 1997-11-06 WO disclosed
US-5597517-A OXALATE ESTER, SOLVENT, ACTIVATOR, FLUORESCER JAME FINE CHEMICALS, INC. (US) 1997-01-28 US disclosed