Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.71 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.71 |
| ▸ | MEN1 | O00255 | 4/20 | 0.67 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.67 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | APP | P05067 | 4/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CASP1 | P29466 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.31 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.31 |
| ▸ | ACHE | P22303 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Di(Hydroxyethyl)Ether SCHEMBL27549537 | 0.85 | — | — | |
| Di(Hydroxyethyl)Ether SCHEMBL6856328 | 0.85 | — | — | |
| Di(Hydroxyethyl)Ether SCHEMBL1462 | 0.84 | — | — | |
| Di(Hydroxyethyl)Ether SCHEMBL2410410 | 0.84 | TSHR (1.00) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| 2-Ethoxyethanol SCHEMBL110078 | 0.84 | — | — | |
| SCHEMBL40114 | 0.82 | — | — | |
| Di(Hydroxyethyl)Ether SCHEMBL6171 | 0.81 | TSHR (0.77) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Di(Hydroxyethyl)Ether SCHEMBL28459383 | 0.81 | — | — | |
| Di(Hydroxyethyl)Ether SCHEMBL9058372 | 0.81 | TSHR (0.77) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Di(Hydroxyethyl)Ether SCHEMBL11143375 | 0.81 | TSHR (0.77) | TSHRMAPK1MEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210317391-A1 | KIT FOR CLEANING AGENT AND METHOD FOR PREPARING CLEANING AGENT | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2021-10-14 | — | — | US | claimed |
| US-7273060-B2 | Methods for chemically treating a substrate using foam technology | EKC TECHNOLOGY, INC. (US) | 2007-09-25 | — | — | US | claimed |
| US-20070135321-A1 | Methods for chemically treating a substrate using foam technology | EKC TECHNOLOGY, INC. | 2007-06-14 | — | — | US | claimed |
| US-20030171239-A1 | Methods and compositions for chemically treating a substrate using foam technology | EKC TECHNOLOGY, INC. | 2003-09-11 | — | — | US | claimed |
| WO-2003064581-A1 | METHODS AND COMPOSITIONS FOR CHEMICALLY TREATING A SUBSTRATE USING FOAM TECHNOLOGY | EKC TECHNOLOGY, INC. (US) | 2003-08-07 | — | — | WO | claimed |
| US-20260028553-A1 | PROCESSING SOLUTION, METHOD FOR MANUFACTURING PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-29 | — | — | US | disclosed |
| US-12374540-B2 | Post-CMP semiconductor cleaning composition comprising an amine/alkanolamine mixture | FUJIFILM CORPORATION (JP) | 2025-07-29 | — | — | US | disclosed |
| US-12312569-B2 | Kit for cleaning agent and method for preparing cleaning agent | FUJIFILM CORPORATION (JP) | 2025-05-27 | — | — | US | disclosed |
| US-12187943-B2 | Chemical solution used for cleaning or etching ruthenium-containing layer and method for fabricating ruthenium wiring | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-01-07 | — | — | US | disclosed |
| US-11898081-B2 | Ruthenium-etching solution, method for manufacturing ruthenium-etching solution, method for processing object to be processed, and method for manufacturing ruthenium-containing wiring | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-13 | — | — | US | disclosed |
| US-20220254624-A1 | CLEANING METHOD | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2022-08-11 | — | — | US | disclosed |
| US-20220243127-A1 | CHEMICAL SOLUTION USED FOR CLEANING OR ETCHING RUTHENIUM-CONTAINING LAYER AND METHOD FOR FABRICATING RUTHENIUM WIRING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-08-04 | — | — | US | disclosed |
| US-20210317391-A1 | KIT FOR CLEANING AGENT AND METHOD FOR PREPARING CLEANING AGENT | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2021-10-14 | — | — | US | disclosed |
| US-20210155851-A1 | RUTHENIUM-ETCHING SOLUTION, METHOD FOR MANUFACTURING RUTHENIUM-ETCHING SOLUTION, METHOD FOR PROCESSING OBJECT TO BE PROCESSED, AND METHOD FOR MANUFACTURING RUTHENIUM-CONTAINING WIRING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-27 | — | — | US | disclosed |
| US-8003587-B2 | Semiconductor process residue removal composition and process | EKC TECHNOLOGY, INC. (US) | 2011-08-23 | — | — | US | disclosed |
| US-20090203566-A1 | Semi Conductor Process Residue Removal Composition and Process | EKC TECHNOLOGY, INC. | 2009-08-13 | — | — | US | disclosed |
| EP-1362262-A1 | SEMICONDUCTOR DEVELOPING AGENT | HUNTSMAN PETROCHEMICAL CORPORATION (US) | 2003-11-19 | — | — | EP | disclosed |
| WO-2002069052-A1 | SEMICONDUCTOR DEVELOPING AGENT | HUNTSMAN PETROCHEMICAL CORPORATION (US) | 2002-09-06 | — | — | WO | disclosed |
| US-6340559-B1 | IN THE MANUFACTURE OF INTEGRATED CIRCUITS | HUNTSMAN PETROCHEMICAL CORPORATION | 2002-01-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260028553-A1 | PROCESSING SOLUTION, METHOD FOR MANUFACTURING PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TET2, TET1, KDM2A | TSHR 3546/4885MAPK1 1109/4885MEN1 3376/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.