Methacrylic Acid

Methacrylic Acid

SCHEMBL2274126

C=C(C)C(=O)O.C=C(C)C(=O)O.CC1(O)CCC(O)CC1

nearest known ligand 0.34

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.34
POLB P06746 1/20 0.34
SERPINA6 P08185 1/20 0.33
ATP1A1 P05023 1/20 0.33
ATP1B1 P05026 1/20 0.33
ATP1A3 P13637 1/20 0.33
ATP1B2 P14415 1/20 0.33
ATP1A2 P50993 1/20 0.33
ATP1B3 P54709 1/20 0.33
FXYD2 P54710 1/20 0.33
ATP1A4 Q13733 1/20 0.33
GABRP O00591 2/20 0.33
GABRD O14764 2/20 0.33
G6PD P11413 2/20 0.33
GABRA1 P14867 2/20 0.33
GABRB1 P18505 2/20 0.33
GABRG2 P18507 2/20 0.33
GABRB3 P28472 2/20 0.33
GABRA5 P31644 2/20 0.33
GABRA3 P34903 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL28436332 0.86 EPHX2 (0.35) SMN1; SMN2POLBGABRPGABRDG6PD
Methacrylic Acid SCHEMBL342183 0.80 EPHX2 (0.39) LMNA
Methacrylic Acid SCHEMBL16566992 0.80 EPHX2 (0.39) LMNA
Methacrylic Acid SCHEMBL17361257 0.80 EPHX2 (0.39) LMNA
Methacrylic Acid SCHEMBL372981 0.80 EPHX2 (0.39) LMNA
Acrylic Acid SCHEMBL10781809 0.80 LMNA (0.40) SERPINA6ATP1A1ATP1B1ATP1A3ATP1B2
SCHEMBL180095 0.80
SCHEMBL16750985 0.80
SCHEMBL16730136 0.80
Methacrylic Acid SCHEMBL28874749 0.79 FFAR3 (0.35) SMN1; SMN2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12325806-B2 Photocurable composition for use in 3D printing BASF SE (DE) 2025-06-10 US disclosed
CN-111051468-B Homogeneous anaerobically stable quantum dot concentrates 昭荣化学工业株式会社 2024-06-04 CN disclosed
CN-111164129-B PEG-based ligands with enhanced dispersibility and improved properties 昭荣化学工业株式会社 2024-03-12 CN disclosed
EP-3681961-B1 APPLICATION OF POLYFUNCTIONAL LIGANDS FOR IMPROVING PERFORMANCE AND STABILITY OF QUANTUM DOT INKS SHOEI CHEMICAL IND CO (JP) 2023-12-27 EP disclosed
US-11584646-B2 Homogeneous anaerobically stable quantum dot concentrates NANOSYS, INC. (US) 2023-02-21 US disclosed
CN-111465660-B Use of multifunctional ligands for improving performance and stability of quantum dot inks 纳米系统公司 2022-11-04 CN disclosed
US-11267980-B2 Application of polyfunctional ligands for improving performance and stability of quantum dot inks NANOSYS, INC. (US) 2022-03-08 US disclosed
US-20220033678-A1 PHOTOCURABLE COMPOSITION FOR USE IN 3D PRINTING BASF SE (DE) 2022-02-03 US disclosed
US-11041071-B2 Peg-based ligands with enhanced dispersibility and improved performance NANOSYS, INC. (US) 2021-06-22 US disclosed
US-20210130170-A1 HOMOGENEOUS ANAEROBICALLY STABLE QUANTUM DOT CONCENTRATES NANOSYS, INC. (US) 2021-05-06 US disclosed
CN-111164129-A PEG-based ligands with enhanced dispersibility and improved performance 纳米系统公司 2020-05-15 CN disclosed
CN-111051468-A Homogeneous anaerobically stable quantum dot concentrates 纳米系统公司 2020-04-21 CN disclosed
US-20190077954-A1 PEG-BASED LIGANDS WITH ENHANCED DISPERSIBILITY AND IMPROVED PERFORMANCE NANOSYS, INC. (US) 2019-03-14 US disclosed
WO-2019035957-A1 PEG-BASED LIGANDS WITH ENHANCED DISPERSIBILITY AND IMPROVED PERFORMANCE NANOSYS, INC. (US) 2019-02-21 WO disclosed
US-20180370800-A1 HOMOGENEOUS ANAEROBICALLY STABLE QUANTUM DOT CONCENTRATES NANOSYS, INC. (US) 2018-12-27 US disclosed
WO-2018237236-A1 HOMOGENEOUS ANAEROBICALLY STABLE QUANTUM DOT CONCENTRATES SMITH AUSTIN (US) 2018-12-27 WO disclosed
WO-2018226654-A1 ACID STABILIZATION OF QUANTUM DOT-RESIN CONCENTRATES AND PREMIXES SMITH AUSTIN (US) 2018-12-13 WO disclosed
US-20180345638-A1 ACID STABILIZATION OF QUANTUM DOT-RESIN CONCENTRATES AND PREMIXES NANOSYS, INC. (US) 2018-12-06 US disclosed
WO-2012126695-A1 STABLE CURABLE THIOL-ENE COMPOSITION HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2012-09-27 WO disclosed
US-20110195237-A1 SYSTEM AND RESIN FOR RAPID PROTOTYPING HUNTSMAN INTERNATIONAL LLC (US) 2011-08-11 US disclosed