SCHEMBL22745995

SCHEMBL22745995

CCC1(C)CC(C)(CC)C(=O)N(c2ccccc2)C1=O

nearest known ligand 0.62

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ELANE P08246 10/20 0.62
SLC6A2 P23975 2/20 0.47
PGR P06401 1/20 0.42
ALDH1A1 P00352 2/20 0.42
KDM4E B2RXH2 1/20 0.42
TSHR P16473 1/20 0.42
CACNA1B Q00975 1/20 0.41
APBA1 Q02410 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22580654 0.92 ELANE (0.57) ELANESLC6A2PGRALDH1A1KDM4E
SCHEMBL22746009 0.79 ELANE (0.48) ELANESLC6A2PGRALDH1A1KDM4E
SCHEMBL22746205 0.75 ELANE (0.62) ELANEPGRALDH1A1CACNA1BAPBA1
SCHEMBL10948887 0.74 ELANE (0.63) ELANEPGRALDH1A1CACNA1BAPBA1
SCHEMBL22745971 0.74 ELANE (0.61) ELANEPGRALDH1A1CACNA1BAPBA1
SCHEMBL17716273 0.72 ELANE (0.89) ELANEPGR
SCHEMBL22746194 0.71 ELANE (0.53) ELANESLC6A2ALDH1A1TSHRSMN1; SMN2
SCHEMBL10774814 0.70 MAPT (0.45) ELANEALDH1A1SMN1; SMN2
SCHEMBL10952562 0.69 ELANE (1.00) ELANEALDH1A1KDM4ESMN1; SMN2
SCHEMBL11292003 0.69 ELANE (0.53) ELANEALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11676814-B2 Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-13 US disclosed
US-20200381247-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-03 US disclosed