SCHEMBL22745971

SCHEMBL22745971

CC1(C)C(=O)N(c2ccccc2)C(=O)C1(C)C

nearest known ligand 0.61

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ELANE P08246 6/20 0.61
PGR P06401 1/20 0.52
MGLL Q99685 1/20 0.50
CACNA1B Q00975 1/20 0.50
APBA1 Q02410 1/20 0.50
ALDH1A1 P00352 2/20 0.49
GAA P10253 1/20 0.48
GSK3A P49840 1/20 0.46
GSK3B P49841 1/20 0.46
GRK5 P34947 1/20 0.44
TYRO3 Q06418 1/20 0.44
DYRK1B Q9Y463 1/20 0.44
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
MAOA P21397 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10948887 0.86 ELANE (0.63) ELANEPGRMGLLCACNA1BAPBA1
SCHEMBL22746205 0.82 ELANE (0.62) ELANEPGRMGLLCACNA1BAPBA1
SCHEMBL11654508 0.77 PGR (0.58) ELANEPGRMGLLCACNA1BAPBA1
SCHEMBL19105195 0.76 ELANE (0.55) ELANEPGRMGLLCACNA1BAPBA1
SCHEMBL11292003 0.74 ELANE (0.53) ELANEMGLLALDH1A1GAAMEN1
SCHEMBL22745995 0.74 ELANE (0.62) ELANEPGRCACNA1BAPBA1ALDH1A1
SCHEMBL11465842 0.74 AR (0.68) ELANEPGRCACNA1BAPBA1MEN1
SCHEMBL22745900 0.73 ELANE (0.45) ELANEPGR
SCHEMBL22938728 0.73 CACNA1B (0.51) ELANEPGRMGLLCACNA1BAPBA1
SCHEMBL19923441 0.73 GRM4 (0.57) ELANEPGRMGLLCACNA1BAPBA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11676814-B2 Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-13 US disclosed
US-20200381247-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-03 US disclosed