SCHEMBL22746196

SCHEMBL22746196

Cc1ccc(C(=O)Nc2ccc(C(c3ccc(NC(=O)c4ccc(C)c(C)c4)cc3)(C(F)(F)F)C(F)(F)F)cc2)cc1C

nearest known ligand 0.58

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 5/20 0.58
▸ RAB9A P51151 5/20 0.58
▸ KMT2A Q03164 1/20 0.58
▸ SMN1; SMN2 Q16637 2/20 0.54
▸ MAPT P10636 1/20 0.54
▸ TRPV1 Q8NER1 4/20 0.52
▸ KCNQ3 O43525 1/20 0.52
▸ KCNQ2 O43526 1/20 0.52
▸ RORC P51449 1/20 0.51
▸ KIT P10721 1/20 0.50
▸ TDP1 Q9NUW8 1/20 0.50
▸ FKBP5 Q13451 1/20 0.49
▸ HDAC3 O15379 1/20 0.49
▸ HDAC8 Q9BY41 1/20 0.49
▸ HDAC6 Q9UBN7 1/20 0.49
▸ PTGS1 P23219 2/20 0.49
▸ LMNA P02545 1/20 0.48
▸ THRB P10828 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22580593 0.92 TDP1 (0.62) NPC1RAB9AKMT2ASMN1; SMN2MAPT
SCHEMBL13213988 0.84 KMT2A (0.52) NPC1RAB9AKMT2ASMN1; SMN2MAPT
SCHEMBL25815389 0.84 NPC1 (0.72) NPC1RAB9AKMT2ASMN1; SMN2MAPT
SCHEMBL25721410 0.84 HDAC6 (0.67) NPC1RAB9AKMT2ASMN1; SMN2MAPT
SCHEMBL21588673 0.84 HDAC6 (0.67) NPC1RAB9AKMT2ASMN1; SMN2MAPT
SCHEMBL22746195 0.84 NPC1 (0.63) NPC1RAB9AKMT2ASMN1; SMN2MAPT
SCHEMBL18160357 0.80 KMT2A (0.65) NPC1RAB9AKMT2ASMN1; SMN2MAPT
SCHEMBL22580585 0.80 NPC1 (0.66) NPC1RAB9AKMT2ASMN1; SMN2MAPT
SCHEMBL22580645 0.80 NPC1 (0.66) NPC1RAB9AKMT2ASMN1; SMN2MAPT
SCHEMBL2622747 0.80 NPC1 (0.72) NPC1RAB9AKMT2ASMN1; SMN2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11676814-B2 Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-13 — — US disclosed
US-20200381247-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-03 — — US disclosed
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