⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3751552 | 0.94 | ALDH1A1 (0.30) | — | |
| SCHEMBL22407 | 0.94 | ALDH1A1 (0.30) | — | |
| SCHEMBL27552944 | 0.89 | — | — | |
| SCHEMBL5770459 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL2142590 | 0.89 | — | — | |
| Bromide SCHEMBL4443445 | 0.89 | — | — | |
| Water SCHEMBL2864553 | 0.89 | — | — | |
| SCHEMBL2940431 | 0.89 | — | — | |
| Fluoride SCHEMBL634472 | 0.89 | — | — | |
| Ammonia Solution, Strong SCHEMBL15353600 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10370254-B2 | Method for producing borazane | AIRBUS SAFRAN LAUNCHERS SAS (FR) | 2019-08-06 | — | — | US | claimed |
| EP-3145863-B1 | METHOD FOR PRODUCING BORAZANE | ARIANEGROUP SAS (FR) | 2018-10-17 | — | — | EP | claimed |
| US-20170305750-A1 | METHOD FOR PRODUCING BORAZANE | AIRBUS SAFRAN LAUNCHERS SAS (FR) | 2017-10-26 | — | — | US | claimed |
| EP-3145863-A1 | METHOD FOR PRODUCING BORAZANE | Airbus Safran Launchers SAS (FR) | 2017-03-29 | — | — | EP | claimed |
| WO-2015177483-A1 | METHOD FOR PRODUCING BORAZANE | HERAKLES (FR) | 2015-11-26 | — | — | WO | claimed |
| US-7998859-B2 | Surface preparation process for damascene copper deposition | ENTHONE INC. (US) | 2011-08-16 | — | — | US | claimed |
| US-20100075496-A1 | SURFACE PREPARATION PROCESS FOR DAMASCENE COPPER DEPOSITION | ENTHONE INC. (US) | 2010-03-25 | — | — | US | claimed |
| US-5481038-A | Borane-N,N-diisopropylalkylamine hydroboration agents | ALDRICH CHEMICAL COMPANY, INC. (US) | 1996-01-02 | — | — | US | claimed |
| US-10370254-B2 | Method for producing borazane | AIRBUS SAFRAN LAUNCHERS SAS (FR) | 2019-08-06 | — | — | US | disclosed |
| EP-3145863-B1 | METHOD FOR PRODUCING BORAZANE | ARIANEGROUP SAS (FR) | 2018-10-17 | — | — | EP | disclosed |
| US-20170305750-A1 | METHOD FOR PRODUCING BORAZANE | AIRBUS SAFRAN LAUNCHERS SAS (FR) | 2017-10-26 | — | — | US | disclosed |
| CN-107074540-A | The method for producing ammonia borane | 空客赛峰发射器有限公司 | 2017-08-18 | — | — | CN | disclosed |
| EP-3145863-A1 | METHOD FOR PRODUCING BORAZANE | Airbus Safran Launchers SAS (FR) | 2017-03-29 | — | — | EP | disclosed |
| WO-2015177483-A1 | METHOD FOR PRODUCING BORAZANE | HERAKLES (FR) | 2015-11-26 | — | — | WO | disclosed |
| US-20070066057-A1 | Defectivity and process control of electroless deposition in microelectronics applications | ENTHONE INC. (US) | 2007-03-22 | — | — | US | disclosed |
| US-20070066059-A1 | Defectivity and process control of electroless deposition in microelectronics applications | ENTHONE INC. (US) | 2007-03-22 | — | — | US | disclosed |
| US-20070066058-A1 | Composition for electrolessly depositing cobalt, nickel, or alloys thereof onto a substrate in manufacture of microelectronic devices, comprising a source of deposition ions selected from cobalt ions and nickel ions, and a leveler comprising a triethanolamine salt of lauryl sulfate | ENTHONE INC. (US) | 2007-03-22 | — | — | US | disclosed |
| US-20060266654-A1 | METHOD FOR SUPPLYING A PLATING COMPOSITION WITH DEPOSITION METAL ION DURING A PLATING OPERATION | ENTHONE INC. (US) | 2006-11-30 | — | — | US | disclosed |
| US-5481038-A | Borane-N,N-diisopropylalkylamine hydroboration agents | ALDRICH CHEMICAL COMPANY, INC. (US) | 1996-01-02 | — | — | US | disclosed |
| US-4855440-A | COLORFASTNESS | SHEREX CHEMICAL COMPANY, INC. (US) | 1989-08-08 | — | — | US | disclosed |