SCHEMBL22787367

SCHEMBL22787367

C1CCN([SiH2]N[SiH2]N2CCCC2)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22787362 0.97
SCHEMBL22787360 0.93
SCHEMBL22787359 0.85
SCHEMBL6461218 0.65
SCHEMBL22100503 0.62 MGLL (0.33)
SCHEMBL21461412 0.60
SCHEMBL21461416 0.58
SCHEMBL25222876 0.57
SCHEMBL27215578 0.57
SCHEMBL28108136 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11358974-B2 Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition DNF CO., LTD. (KR) 2022-06-14 US disclosed
US-20200392294-A1 SILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING THE SAME, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE COMPOSITION DNF CO., LTD. (KR) 2020-12-17 US disclosed