SCHEMBL22788076

SCHEMBL22788076

C=C(C)C(O)OC1(C(C)C)CCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22767946 0.98 — —
SCHEMBL23864901 0.80 SLC6A4 (0.30) —
SCHEMBL17322713 0.74 MME (0.35) —
SCHEMBL23309553 0.74 — —
SCHEMBL10218670 0.72 — —
SCHEMBL10218671 0.72 — —
SCHEMBL22064296 0.72 — —
SCHEMBL5390033 0.71 TSHR (0.36) —
SCHEMBL10218679 0.69 — —
SCHEMBL22236883 0.69 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200393764-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND POLYESTER FUJIFILM CORPORATION (JP) 2020-12-17 — — US disclosed
Send feedback