SCHEMBL2279336

SCHEMBL2279336

Cc1ccccc1S(=O)(=O)[O-].Cc1ccccc1S(=O)(=O)[O-].[Ni+2]

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.42
MEN1 O00255 1/20 0.41
ESR1 P03372 1/20 0.41
GAA P10253 1/20 0.41
KMT2A Q03164 1/20 0.41
ESR2 Q92731 1/20 0.41
TSHR P16473 1/20 0.41
ACHE P22303 1/20 0.41
RAPGEF4 Q8WZA2 1/20 0.41
TDP1 Q9NUW8 2/20 0.40
LMNA P02545 1/20 0.40
ALDH1A1 P00352 4/20 0.40
KDM4E B2RXH2 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
TP53 P04637 1/20 0.40
RXFP1 Q9HBX9 1/20 0.39
EDNRA P25101 1/20 0.39
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL11621677 0.98 HSD11B1 (0.41) HSD11B1MEN1ESR1GAAKMT2A
SCHEMBL8954958 0.95 HSD11B1 (0.42) HSD11B1MEN1ESR1GAAKMT2A
SCHEMBL5399285 0.95 HSD11B1 (0.42) HSD11B1MEN1ESR1GAAKMT2A
SCHEMBL135009 0.95 HSD11B1 (0.42) HSD11B1MEN1ESR1GAAKMT2A
SCHEMBL6915057 0.95 HSD11B1 (0.42) HSD11B1MEN1ESR1GAAKMT2A
SCHEMBL57931 0.95 TDP1 (0.45) HSD11B1MEN1ESR1GAAKMT2A
SCHEMBL16034284 0.95 TDP1 (0.45) HSD11B1MEN1ESR1GAAKMT2A
SCHEMBL20658918 0.95 HSD11B1 (0.42) HSD11B1MEN1ESR1GAAKMT2A
SCHEMBL20533883 0.95 HSD11B1 (0.42) HSD11B1MEN1ESR1GAAKMT2A
SCHEMBL6915627 0.95 HSD11B1 (0.42) HSD11B1MEN1ESR1GAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1430166-B1 METHOD FOR DEPOSITING TIN ALLOYS MACDERMID LTD (GB) 2017-02-08 EP claimed
US-7309411-B2 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys CITIBANK, N.A. 2007-12-18 US claimed
EP-1430166-A2 ELECTROLYTE MEDIA FOR THE DEPOSITION OF TIN ALLOYS AND METHODS FOR DEPOSITING TIN ALLOYS MacDermid Plc (GB) 2004-06-23 EP claimed
US-20040065558-A1 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys CITIBANK, N.A. 2004-04-08 US claimed
WO-2002072923-A2 ELECTROLYTE MEDIA FOR THE DEPOSITION OF TIN ALLOYS AND METHODS FOR DEPOSITING TIN ALLOYS MACDERMID PLC (GB) 2002-09-19 WO claimed
US-20240229282-A1 PROCESS FOR HYSTERETIC CURRENT-VOLTAGE MEDIATED VOID-FREE SUPERCONFORMAL AND BOTTOM-UP FILLING GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE 2024-07-11 US disclosed
WO-2022241088-A1 PROCESS FOR HYSTERETIC CURRENT-VOLTAGE MEDIATED VOID FREE SUPERCONFORMAL AND BOTTOM-UP FILLING GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE (US) 2022-11-17 WO disclosed
US-11492252-B2 Method for producing group III-V semiconductor nanoparticle, method for producing group III-V semiconductor quantum dot, and flow reaction system FUJIFILM CORPORATION (JP) 2022-11-08 US disclosed
US-10947112-B2 Method of manufacturing semiconductor quantum dot and semiconductor quantum dot FUJIFILM CORPORATION (JP) 2021-03-16 US disclosed
EP-3604215-A1 METHOD FOR PRODUCING GROUP III-V SEMICONDUCTOR NANOPARTICLE, METHOD FOR PRODUCING GROUP III-V SEMICONDUCTOR QUANTUM DOT, AND FLOW REACTION SYSTEM Fujifilm Corporation (JP) 2020-02-05 EP disclosed
US-20190284714-A9 PROCESS FOR FORMING A TRANSITION ZONE TERMINATED SUPERCONFORMAL FILLING THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE 2019-09-19 US disclosed
US-20190027562-A1 METHOD OF MANUFACTURING SEMICONDUCTOR QUANTUM DOT AND SEMICONDUCTOR QUANTUM DOT FUJIFILM CORPORATION (JP) 2019-01-24 US disclosed
US-7999058-B2 Method for producing aromatic polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-16 US disclosed
US-20100168369-A1 METHOD FOR PRODUCING AROMATIC POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-01 US disclosed
US-20100099823-A1 METHOD FOR PRODUCTION OF BLOCK COPOLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-04-22 US disclosed
EP-2112186-A1 METHOD FOR PRODUCTION OF BLOCK COPOLYMER Sumitomo Chemical Company, Limited (JP) 2009-10-28 EP disclosed
US-7309411-B2 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys CITIBANK, N.A. 2007-12-18 US disclosed
EP-1430166-A2 ELECTROLYTE MEDIA FOR THE DEPOSITION OF TIN ALLOYS AND METHODS FOR DEPOSITING TIN ALLOYS MacDermid Plc (GB) 2004-06-23 EP disclosed
US-20040065558-A1 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys CITIBANK, N.A. 2004-04-08 US disclosed
WO-2002072923-A2 ELECTROLYTE MEDIA FOR THE DEPOSITION OF TIN ALLOYS AND METHODS FOR DEPOSITING TIN ALLOYS MACDERMID PLC (GB) 2002-09-19 WO disclosed