⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL1065842 | 0.98 | ALDH1A1 (0.48) | — | |
| SCHEMBL68618 | 0.87 | ALDH1A1 (0.50) | — | |
| SCHEMBL15164687 | 0.87 | ALDH1A1 (0.57) | — | |
| SCHEMBL13003549 | 0.86 | ALDH1A1 (0.58) | — | |
| SCHEMBL5097428 | 0.85 | ALDH1A1 (0.48) | — | |
| Hydrochloric Acid SCHEMBL1062025 | 0.85 | ALDH1A1 (0.48) | — | |
| SCHEMBL19034693 | 0.85 | ALDH1A1 (0.56) | — | |
| SCHEMBL14140950 | 0.84 | ALDH1A1 (0.54) | — | |
| SCHEMBL8018063 | 0.83 | ALDH1A1 (0.43) | — | |
| Acetic Acid SCHEMBL8586630 | 0.83 | ALDH1A1 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1864489-A | Antodotal growing agent for plants | SUN DUNHENG (CN) | 2006-11-22 | — | — | CN | claimed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230305394-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305393-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| CN-110016136-B | Novel tetracarboxylic dianhydride, polyimide resin, method for producing same, photosensitive resin composition, and method for forming pattern | 信越化学工业株式会社 | 2021-09-24 | — | — | CN | disclosed |
| CN-105301905-B | Chemically amplified positive resist composition and patterning method | 信越化学工业株式会社 | 2020-11-20 | — | — | CN | disclosed |
| US-9958776-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-01 | — | — | US | disclosed |
| US-20180101094-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-04-12 | — | — | US | disclosed |
| EP-1245571-A1 | BENZBISAZOLE COMPOUND AND OPTICAL RECORDING MEDIUM CONTAINING THE COMPOUND | Mitsui Chemicals, Inc. (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1180765-A1 | Optical recording medium and porphycene compound | Mitsui Chemicals, Inc. (JP) | 2002-02-20 | — | — | EP | disclosed |
| EP-0811662-B1 | Isoindoleninamide dyes | DYSTAR TEXTILFARBEN GMBH & CO (DE) | 2001-09-05 | — | — | EP | disclosed |
| US-6201126-B1 | Isoindolenineamide dyestuffs | BAYER AKTIENGESELLSCHAFT (DE) | 2001-03-13 | — | — | US | disclosed |
| US-5780501-A | ADMINISTERING TO A MAMMAL | NOVARTIS CORPORATION (US) | 1998-07-14 | — | — | US | disclosed |
| US-5780500-A | Anti-neurodegeneratively active 10-aminoaliphatyl-dibenzi b,f! oxepines | NOVARTIS CORPORATION (US) | 1998-07-14 | — | — | US | disclosed |
| WO-1997046549-A1 | ANTI-NEURODEGENERATIVELY EFFECTIVE XANTHENE DERIVATIVES | NOVARTIS AG (CH) | 1997-12-11 | — | — | WO | disclosed |
| EP-0811662-A2 | Isoindoleninamide dyes | BAYER AG (DE) | 1997-12-10 | — | — | EP | disclosed |
| WO-1997045422-A1 | ANTI-NEURODEGENERATIVELY EFFECTIVE 10-AMINOALIPHATYL-DIBENZ[b,f]OXEPINE SALTS | NOVARTIS AG (CH) | 1997-12-04 | — | — | WO | disclosed |
| EP-0726265-A1 | 10-Aminoaliphatyl-dibenz(b,f)oxepins with antineurodegenarative activity | CIBA-GEIGY AG (CH) | 1996-08-14 | — | — | EP | disclosed |