Nitric Acid

Nitric Acid

SCHEMBL228157

O.O.O.O=[N+]([O-])O.[Tl]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

ERG11

The experimentally established mechanism targets of Nitric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Nitric Acid SCHEMBL6074697 1.00 CA5A (0.80)
Nitric Acid SCHEMBL6074693 0.95 CA5A (0.73)
Nitric Acid SCHEMBL8510743 0.95 CA5A (0.89)
Nitric Acid SCHEMBL21523563 0.95 CA5A (0.89)
Nitric Acid SCHEMBL7618413 0.95 CA5A (0.89)
Nitric Acid SCHEMBL1943526 0.95
Nitric Acid SCHEMBL479716 0.95
Nitric Acid SCHEMBL6346653 0.95
Nitric Acid SCHEMBL228897 0.95 CA5A (0.89)
Nitric Acid SCHEMBL19616567 0.95 CA5A (0.89)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119425714-A Forming method of strip-shaped carrier, preparation method of metal-loaded catalyst, catalyst and application of catalyst 中国石油化工股份有限公司 2025-02-14 CN claimed
US-9353433-B2 Method of fabricating liquid for oxide thin film INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2016-05-31 US claimed
US-9123818-B2 Compositions for solution process, electronic devices fabricated using the same, and fabrication methods thereof INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2015-09-01 US claimed
US-20140000480-A1 METHOD OF FABRICATING LIQUID FOR OXIDE THIN FILM INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2014-01-02 US claimed
US-8523996-B2 Method of fabricating liquid for oxide thin film INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2013-09-03 US claimed
US-20120080678-A1 COMPOSITIONS FOR SOLUTION PROCESS, ELECTRONIC DEVICES FABRICATED USING THE SAME, AND FABRICATION METHODS THEREOF INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2012-04-05 US claimed
US-20100251936-A1 METHOD OF FABRICATING LIQUID FOR OXIDE THIN FILM INDUSTRY-ACADEMIC COOPERATION FOUNDATION , (KR) 2010-10-07 US claimed
WO-2009054574-A1 METHOD OF FABRICATING LIQUID FOR OXIDE THIN FILM INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2009-04-30 WO claimed
CN-119425714-A Forming method of strip-shaped carrier, preparation method of metal-loaded catalyst, catalyst and application of catalyst 中国石油化工股份有限公司 2025-02-14 CN disclosed
EP-4391083-A2 COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR Ricoh Company, Ltd. (JP) 2024-06-26 EP disclosed
EP-3350839-B1 COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR RICOH CO LTD (JP) 2024-06-12 EP disclosed
US-11908945-B2 Coating liquid for forming n-type oxide semiconductor film, method for producing n-type oxide semiconductor film, and method for producing field-effect transistor RICOH COMPANY, LTD. (JP) 2024-02-20 US disclosed
EP-3962899-A1 SUBSTITUTED CYCLOLAKYLS AS MODULATORS OF THE INTEGRATED STRESS PATHWAY Calico Life Sciences LLC (US) 2022-03-09 EP disclosed
US-11186564-B2 Dual NAV1.2/5HT2a inhibitors for treating CNS disorders SUNOVION PHARMACEUTICALS INC. (US) 2021-11-30 US disclosed
WO-1991019708-A1 NEW THIOPHENE DERIVATIVES FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1991-12-26 WO disclosed
US-4567293-A ANTIINFLAMMATORY KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1986-01-28 US disclosed
US-4250346-A VAPOR PHASE, CATALYST CONTAINING OXIDES OF MOLYBDENUM AND VANADIUM, NIOBIUM, MANGANESE, TANTALUM AND/OR TITANIUM UNION CARBIDE CORPORATION (US) 1981-02-10 US disclosed
US-4168385-A LOWERING OF STEROL AND TRIGLYCERIDE SERUM LEVELS AMERICAN CYANAMID COMPANY (US) 1979-09-18 US disclosed
US-4162364-A ANTIINFLAMMATORY AGENT LEK TOVARNA FARMACEVTSKIH IN KEMICNIH IZDELKOV, N.SOL.O. (YU) 1979-07-24 US disclosed
US-4125729-A Hypolipemic α-aryloxy para substituted phenyl acetic acid compounds AMERICAN CYANAMID COMPANY (US) 1978-11-14 US disclosed