⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2287850 | 0.90 | — | — | |
| SCHEMBL2283224 | 0.87 | — | — | |
| SCHEMBL2283222 | 0.87 | — | — | |
| SCHEMBL2283041 | 0.87 | — | — | |
| SCHEMBL2289124 | 0.87 | — | — | |
| SCHEMBL2288206 | 0.87 | — | — | |
| SCHEMBL2283080 | 0.87 | — | — | |
| SCHEMBL2283037 | 0.87 | — | — | |
| SCHEMBL2283444 | 0.87 | — | — | |
| SCHEMBL1774372 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7994273-B2 | Photoactive materials | ROLIC AG (CH) | 2011-08-09 | — | — | US | claimed |
| US-7750185-B2 | Photoactive materials | ROLIC AG (CH) | 2010-07-06 | — | — | US | claimed |
| US-20050288480-A1 | Liquid crystals adjustment layers containing diamine compound; polyamic acid or polyimides; crosslinked | ROLIC AG (CH) | 2005-12-29 | — | — | US | claimed |
| EP-1386910-A1 | Photoactive materials | Rolic AG (CH) | 2004-02-04 | — | — | EP | claimed |
| EP-1525182-B1 | PHOTOACTIVE MATERIALS | ROLIC AG (CH) | 2016-04-06 | — | — | EP | disclosed |
| US-8436132-B2 | Photoactive materials | ROLIC AG (CH) | 2013-05-07 | — | — | US | disclosed |
| US-20110236602-A1 | PHOTOACTIVE MATERIALS | ROLIC AG (CH) | 2011-09-29 | — | — | US | disclosed |
| US-7994273-B2 | Photoactive materials | ROLIC AG (CH) | 2011-08-09 | — | — | US | disclosed |
| US-20100272979-A1 | PHOTOACTIVE MATERIALS | ROLIC AG (CH) | 2010-10-28 | — | — | US | disclosed |
| US-7750185-B2 | Photoactive materials | ROLIC AG (CH) | 2010-07-06 | — | — | US | disclosed |
| US-20050288480-A1 | Liquid crystals adjustment layers containing diamine compound; polyamic acid or polyimides; crosslinked | ROLIC AG (CH) | 2005-12-29 | — | — | US | disclosed |
| EP-1386910-A1 | Photoactive materials | Rolic AG (CH) | 2004-02-04 | — | — | EP | disclosed |
| WO-1996017901-A1 | CHOLESTERIC POLYMER NETWORK | MERCK PATENT GMBH (DE) | 1996-06-13 | — | — | WO | disclosed |
| EP-0648827-A1 | Reactive liquid crystal compounds | MERCK PATENT GmbH (DE) | 1995-04-19 | — | — | EP | disclosed |
| EP-0615630-A1 | LIQUID CRYSTALLINE MATERIAL | MERCK PATENT GmbH (DE) | 1994-09-21 | — | — | EP | disclosed |
| WO-1994008268-A1 | LIQUID CRYSTALLINE MATERIAL | MERCK PATENT GMBH (DE) | 1994-04-14 | — | — | WO | disclosed |
| EP-0591508-A1 | ELECTROOPTICAL LIQUID CRYSTAL SYSTEM | MERCK PATENT GmbH (DE) | 1994-04-13 | — | — | EP | disclosed |
| WO-1993022397-A1 | ELECTROOPTICAL LIQUID CRYSTAL SYSTEM | MERCK PATENT GMBH (DE) | 1993-11-11 | — | — | WO | disclosed |
| US-4690709-A | NONTOXIC AND NONPHYTOTOXIC PHOTOSYNTHESIS INHIBITORS; FUNGICIDES | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-09-01 | — | — | US | disclosed |
| US-4309212-A | POSTEMERGENCE, FUNGICIDES | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1982-01-05 | — | — | US | disclosed |