Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | GMNN | O75496 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | TFPI2 | P48307 | 2/20 | 0.44 |
| ▸ | PMP22 | Q01453 | 2/20 | 0.44 |
| ▸ | TP53 | P04637 | 2/20 | 0.44 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.44 |
| ▸ | THPO | P40225 | 2/20 | 0.44 |
| ▸ | PPM1B | O75688 | 1/20 | 0.44 |
| ▸ | PPP1CC | P36873 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | PPP5C | P53041 | 1/20 | 0.44 |
| ▸ | PPP1CA | P62136 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15383909 | 0.80 | KDM4E (0.38) | KDM4EGMNNLMNATFPI2PMP22 | |
| SCHEMBL24497331 | 0.77 | KDM4E (0.35) | KDM4EGMNNLMNATFPI2PMP22 | |
| SCHEMBL15383910 | 0.77 | KDM4E (0.35) | KDM4EGMNNLMNATFPI2PMP22 | |
| SCHEMBL24193472 | 0.77 | KDM4E (0.35) | KDM4EGMNNLMNATFPI2PMP22 | |
| SCHEMBL22034378 | 0.77 | KDM4E (0.35) | KDM4EGMNNLMNATFPI2PMP22 | |
| SCHEMBL3458350 | 0.76 | — | — | |
| SCHEMBL22854334 | 0.72 | KDM4E (0.31) | KDM4EGMNNLMNATFPI2PMP22 | |
| SCHEMBL17733626 | 0.69 | — | — | |
| SCHEMBL14949899 | 0.68 | — | — | |
| SCHEMBL19829300 | 0.67 | PPP5C (0.41) | RAB9APPP5CSMN1; SMN2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200409264-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-12-31 | — | — | US | disclosed |