SCHEMBL2285935

SCHEMBL2285935

C=CCCCCNC=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2288282 0.97 ADH1B (0.52)
SCHEMBL2283532 0.97 ADH1B (0.52)
SCHEMBL2281691 0.97 ADH1B (0.52)
SCHEMBL2285298 0.97 ADH1B (0.52)
SCHEMBL2282753 0.97 ADH1B (0.52)
SCHEMBL2285775 0.97 ADH1B (0.52)
SCHEMBL2278628 0.95
SCHEMBL1766882 0.83
SCHEMBL13692972 0.80
SCHEMBL1241873 0.80 TSHR (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7994273-B2 Photoactive materials ROLIC AG (CH) 2011-08-09 US claimed
US-7750185-B2 Photoactive materials ROLIC AG (CH) 2010-07-06 US claimed
CN-100551902-C light active material ROLIC AG (CH) 2009-10-21 CN claimed
US-20050288480-A1 Liquid crystals adjustment layers containing diamine compound; polyamic acid or polyimides; crosslinked ROLIC AG (CH) 2005-12-29 US claimed
CN-1671648-A photoactive material ROLIC AG (CH) 2005-09-21 CN claimed
EP-1525182-A1 PHOTOACTIVE MATERIALS Rolic AG (CH) 2005-04-27 EP claimed
WO-2004013086-A1 PHOTOACTIVE MATERIALS ROLIC AG (CH) 2004-02-12 WO claimed
EP-1386910-A1 Photoactive materials Rolic AG (CH) 2004-02-04 EP claimed
WO-2016196994-A9 REAGENTS FOR QUANTITATIVE MASS SPECTROMETRY PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2017-03-02 WO disclosed
US-8436132-B2 Photoactive materials ROLIC AG (CH) 2013-05-07 US disclosed
US-20110236602-A1 PHOTOACTIVE MATERIALS ROLIC AG (CH) 2011-09-29 US disclosed
US-7994273-B2 Photoactive materials ROLIC AG (CH) 2011-08-09 US disclosed
US-20100272979-A1 PHOTOACTIVE MATERIALS ROLIC AG (CH) 2010-10-28 US disclosed
US-7750185-B2 Photoactive materials ROLIC AG (CH) 2010-07-06 US disclosed
US-20050288480-A1 Liquid crystals adjustment layers containing diamine compound; polyamic acid or polyimides; crosslinked ROLIC AG (CH) 2005-12-29 US disclosed
EP-1386910-A1 Photoactive materials Rolic AG (CH) 2004-02-04 EP disclosed
US-5278341-A N-acylaminoalkyl 2-hydroxyethyl sulfides and a process for their preparation HOECHST AKTIENGESELLSCHAFT (DE) 1994-01-11 US disclosed