SCHEMBL22870164

SCHEMBL22870164

CCn1c2ccccc2c2ccc(-c3cc(-c4ccc5c6ccccc6n(CC)c5c4)cc(-c4ccc5c6ccccc6n(CC)c5c4)c3)cc21

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.56
MAPT P10636 5/20 0.56
MEN1 O00255 4/20 0.56
KMT2A Q03164 4/20 0.56
ALDH1A1 P00352 3/20 0.56
HTT P42858 3/20 0.56
HSD17B10 Q99714 2/20 0.56
TDP1 Q9NUW8 2/20 0.56
MAPK1 P28482 2/20 0.56
HPGD P15428 1/20 0.56
HBB P68871 1/20 0.56
KDM1A O60341 1/20 0.50
NPY5R Q15761 3/20 0.49
LMNA P02545 4/20 0.49
POLB P06746 2/20 0.48
PKM P14618 1/20 0.48
NPSR1 Q6W5P4 2/20 0.47
NSD2 O96028 1/20 0.47
RXFP1 Q9HBX9 1/20 0.47
SRC P12931 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5999686 0.96 KDM4E (0.59) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL13620587 0.91 KDM4E (0.54) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL13620583 0.91 KDM4E (0.54) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL6374760 0.91 KDM4E (0.63) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL17809435 0.90 KDM4E (0.58) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL13086962 0.89 MAPT (0.65) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL16482567 0.89 MAPT (0.65) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL15964266 0.88 RXRA (0.56) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL25557648 0.88 KDM4E (0.54) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL26541551 0.87 MAPT (0.54) KDM4EMAPTMEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022172551-A1 LAMINATE, LAYER-FORMING COMPOSITION, LAYER, METHOD FOR MANUFACTURING LAMINATE, AND ELECTRONIC ELEMENT JSR株式会社 2022-08-18 WO disclosed
US-11243468-B2 Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production method JSR CORPORATION (JP) 2022-02-08 US disclosed
US-20210003920-A1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-07 US disclosed