SCHEMBL22875997

SCHEMBL22875997

O=c1c2cc3ccccc3cc2[nH]c2cc3ccccc3cc12

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDE3B Q13370 2/20 0.58
PDE3A Q14432 2/20 0.58
GRIN2D O15399 1/20 0.58
GRIN3B O60391 1/20 0.58
GRIN1 Q05586 1/20 0.58
GRIN2A Q12879 1/20 0.58
GRIN2B Q13224 1/20 0.58
GRIN2C Q14957 1/20 0.58
GRIN3A Q8TCU5 1/20 0.58
GAA P10253 4/20 0.54
KDM4E B2RXH2 4/20 0.54
ALDH1A1 P00352 3/20 0.54
GLA P06280 3/20 0.54
HTT P42858 2/20 0.54
LMNA P02545 2/20 0.54
HPGD P15428 2/20 0.54
SMN1; SMN2 Q16637 2/20 0.54
ATM Q13315 1/20 0.54
ABCG2 Q9UNQ0 1/20 0.49
MEN1 O00255 4/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13412897 0.98 PDE3B (0.56) PDE3BPDE3AGRIN2DGRIN3BGRIN1
SCHEMBL8577889 0.92 GAA (0.69) PDE3BPDE3AGRIN2DGRIN3BGRIN1
SCHEMBL29385786 0.85 AHR (0.56) PDE3BPDE3AGRIN2DGRIN3BGRIN1
SCHEMBL10743051 0.85 AHR (0.56) PDE3BPDE3AGRIN2DGRIN3BGRIN1
SCHEMBL21563925 0.84 PDE3B (0.55) PDE3BPDE3AGRIN2DGRIN3BGRIN1
SCHEMBL12219479 0.83 AHR (0.61) PDE3BPDE3AGRIN2DGRIN3BGRIN1
SCHEMBL12219473 0.83 AHR (0.61) PDE3BPDE3AGRIN2DGRIN3BGRIN1
SCHEMBL19731074 0.83 AHR (0.61) PDE3BPDE3AGRIN2DGRIN3BGRIN1
SCHEMBL22678748 0.81 AHR (0.52) PDE3BPDE3AGRIN2DGRIN3BGRIN1
SCHEMBL12219459 0.81 AHR (0.52) PDE3BPDE3AGRIN2DGRIN3BGRIN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11782347-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 US disclosed
US-11782347-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 US disclosed
US-20210011384-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-14 US disclosed