Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 4/20 | 0.33 |
| ▸ | CA2 | P00918 | 4/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
| ▸ | MMP8 | P22894 | 1/20 | 0.33 |
| ▸ | MMP13 | P45452 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16328562 | 0.85 | EPHX1 (0.37) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL21164000 | 0.82 | EPHX1 (0.44) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL15935702 | 0.81 | EPHX1 (0.59) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL26451839 | 0.81 | EPHX1 (0.59) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL21386076 | 0.81 | EPHX1 (0.55) | EPHX1CA1CA2 | |
| SCHEMBL14949357 | 0.81 | EPHX1 (0.37) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL19820342 | 0.80 | EPHX1 (0.34) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL13103134 | 0.80 | EPHX1 (0.38) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL20109894 | 0.79 | EPHX1 (0.33) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL13102610 | 0.79 | EPHX1 (0.34) | EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11703758-B2 | Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-07-18 | — | — | US | disclosed |
| US-20210011377-A1 | PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-01-14 | — | — | US | disclosed |