Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 5/20 | 0.31 |
| ▸ | CA2 | P00918 | 5/20 | 0.31 |
| ▸ | MMP1 | P03956 | 2/20 | 0.30 |
| ▸ | MMP2 | P08253 | 2/20 | 0.30 |
| ▸ | MMP9 | P14780 | 2/20 | 0.30 |
| ▸ | MMP8 | P22894 | 2/20 | 0.30 |
| ▸ | MMP13 | P45452 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19820342 | 0.86 | EPHX1 (0.34) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL16328562 | 0.84 | EPHX1 (0.37) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL21164000 | 0.84 | EPHX1 (0.44) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL21421506 | 0.84 | EPHX1 (0.35) | EPHX1CA1CA2 | |
| SCHEMBL22876809 | 0.79 | EPHX1 (0.40) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL14949357 | 0.77 | EPHX1 (0.37) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL26451839 | 0.74 | EPHX1 (0.59) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL15935702 | 0.74 | EPHX1 (0.59) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL13103134 | 0.73 | EPHX1 (0.38) | EPHX1CA1CA2MMP1MMP2 | |
| SCHEMBL21653874 | 0.72 | ALDH1A1 (0.37) | CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10928727-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing | FUJIFILM CORPORATION (JP) | 2021-02-23 | — | — | US | disclosed |
| US-10663864-B2 | Pattern forming method, method for manufacturing electronic device, and laminate | FUJIFILM CORPORATION (JP) | 2020-05-26 | — | — | US | disclosed |
| US-20180181003-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180120701-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |