SCHEMBL2289576

SCHEMBL2289576

C=C[Si](O)(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2290926 0.83
SCHEMBL2292102 0.79 TSHR (0.35)
SCHEMBL2288387 0.75 TSHR (0.32)
SCHEMBL203443 0.73
SCHEMBL15302082 0.73
SCHEMBL2294067 0.71 TSHR (0.38)
SCHEMBL2286988 0.71
SCHEMBL3481884 0.69
SCHEMBL2292616 0.68 TSHR (0.35)
SCHEMBL234682 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10723845-B2 Process for preparing linear carbosiloxane polymers DOW SILICONES CORPORATION (US) 2020-07-28 US claimed
US-20200079911-A1 PROCESS FOR PREPARING LINEAR CARBOSILOXANE POLYMERS DOW CORNING EUROPE S.A. 2020-03-12 US claimed
CN-108350172-A PROCESS FOR PREPARING LINEAR CARBOSILOXANE POLYMERS 美国陶氏有机硅公司 2018-07-31 CN claimed
EP-3153540-B1 PROCESS FOR PREPARING LINEAR CARBOSILOXANE POLYMERS DOW CORNING (US) 2018-06-06 EP claimed
WO-2017062091-A1 PROCESS FOR PREPARING LINEAR CARBOSILOXANE POLYMERS DOW CORNING CORPORATION (US) 2017-04-13 WO claimed
EP-3153540-A1 PROCESS FOR PREPARING LINEAR CARBOSILOXANE POLYMERS Dow Corning Corporation (US) 2017-04-12 EP claimed
US-9219037-B2 Low k porous SiCOH dielectric and integration with post film formation treatment GLOBALFOUNDRIES INC. (IL) 2015-12-22 US claimed
US-8268489-B2 Non-aqueous electrolyte solution for lithium secondary battery and lithium secondary battery comprising the same LG CHEM, LTD. (KR) 2012-09-18 US claimed
US-20110206999-A1 NON-AQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY COMPRISING THE SAME LG CHEM, LTD. (KR) 2011-08-25 US claimed
WO-2025062904-A1 SILICONE COMPOSITION AND METHOD FOR PRODUCING SAME 信越化学工業株式会社 2025-03-27 WO disclosed
EP-3103842-B1 CURABLE SILICONE COMPOSITION, CURED OBJECT THEREOF, AND OPTICAL SEMICONDUCTOR DEVICE DOW TORAY CO LTD (JP) 2023-01-11 EP disclosed
CN-110088207-B Curable silicone composition and optical semiconductor device using the same 陶氏东丽株式会社 2022-10-14 CN disclosed
EP-3039079-B1 CURABLE SILICONE COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL SEMICONDUCTOR DEVICE DDP SPECIALTY ELECTRONIC MAT US 9 LLC (US) 2022-05-18 EP disclosed
US-10723845-B2 Process for preparing linear carbosiloxane polymers DOW SILICONES CORPORATION (US) 2020-07-28 US disclosed
US-20110206999-A1 NON-AQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY COMPRISING THE SAME LG CHEM, LTD. (KR) 2011-08-25 US disclosed
WO-2009032488-A1 IMPROVED LOW K POROUS SICOH DIELECTRIC AND INTEGRATION WITH POST FILM FORMATION TREATMENT INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-03-12 WO disclosed
US-20090061237-A1 LOW k POROUS SiCOH DIELECTRIC AND INTEGRATION WITH POST FILM FORMATION TREATMENT INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-03-05 US disclosed
US-20090061649-A1 LOW k POROUS SiCOH DIELECTRIC AND INTEGRATION WITH POST FILM FORMATION TREATMENT INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-03-05 US disclosed
US-7279589-B2 Preparation of 1-(alkoxysilyl)ethyl-1,1,3,3-tetramethyldisiloxane SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-09 US disclosed
US-20070037997-A1 Reacting vinyl-containing alkoxysilane in portions with 1,1,3,3-tetramethyldisiloxane in the presence of a rhodium compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-15 US disclosed