SCHEMBL2292102

SCHEMBL2292102

C=C[Si](O)(CC)CCCC

nearest known ligand 0.35

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.35
ALDH1A1 P00352 1/20 0.35
ZDHHC20 Q5W0Z9 1/20 0.32
ZDHHC2 Q9UIJ5 1/20 0.32
FAAH O00519 1/20 0.31
HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29179306 0.91 TSHR (0.39) TSHRALDH1A1ZDHHC20ZDHHC2FAAH
SCHEMBL2294067 0.90 TSHR (0.38) TSHRALDH1A1ZDHHC20ZDHHC2FAAH
SCHEMBL2292616 0.86 TSHR (0.35) TSHRALDH1A1ZDHHC20ZDHHC2FAAH
SCHEMBL2290926 0.85
SCHEMBL2289576 0.79
SCHEMBL15302506 0.75
SCHEMBL3482708 0.75 TSHR (0.38) TSHRALDH1A1ZDHHC20ZDHHC2FAAH
SCHEMBL2288387 0.74 TSHR (0.32) TSHR
SCHEMBL2292627 0.73
SCHEMBL2285686 0.72 EPHX2 (0.36) FAAHHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8268489-B2 Non-aqueous electrolyte solution for lithium secondary battery and lithium secondary battery comprising the same LG CHEM, LTD. (KR) 2012-09-18 US claimed
US-20110206999-A1 NON-AQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY COMPRISING THE SAME LG CHEM, LTD. (KR) 2011-08-25 US claimed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
US-8268489-B2 Non-aqueous electrolyte solution for lithium secondary battery and lithium secondary battery comprising the same LG CHEM, LTD. (KR) 2012-09-18 US disclosed
US-20110206999-A1 NON-AQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY COMPRISING THE SAME LG CHEM, LTD. (KR) 2011-08-25 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed