⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL27550893 | 0.97 | ALDH1A1 (0.48) | — | |
| SCHEMBL560454 | 0.83 | ALDH1A1 (0.59) | — | |
| SCHEMBL29133876 | 0.78 | ALDH1A1 (0.53) | — | |
| SCHEMBL777018 | 0.77 | — | — | |
| SCHEMBL27913212 | 0.77 | — | — | |
| SCHEMBL27747463 | 0.77 | — | — | |
| Hydroxyamine SCHEMBL28443903 | 0.75 | ALDH1A1 (0.50) | — | |
| Dimethylamine SCHEMBL30080133 | 0.75 | ALDH1A1 (0.50) | — | |
| Ammonia Solution, Strong SCHEMBL6915297 | 0.75 | ALDH1A1 (0.32) | — | |
| SCHEMBL14675910 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220267639-A1 | GATE INSULATING FILM FORMING COMPOSITION | MERCK PATENT GMBH (DE) | 2022-08-25 | — | — | US | disclosed |
| EP-3322018-B1 | POLYMER ELECTROLYTE MEMBRANE PRODUCTION METHOD, POLYMER ELECTROLYTE MEMBRANE PRODUCED USING SAME, MEMBRANE ELECTRODE ASSEMBLY COMPRISING SAID POLYMER ELECTROLYTE MEMBRANE, AND FUEL CELL COMPRISING SAID MEMBRANE ELECTRODE ASSEMBLY | LG CHEMICAL LTD (KR) | 2021-01-20 | — | — | EP | disclosed |
| CN-101547700-A | Compositions, kits and uses for protecting the skin against pathogenic microorganisms | ORGANOBALANCE GMBH (DE) | 2009-09-30 | — | — | CN | disclosed |
| CN-101287441-A | Cosmetic preparation for skin | BASF SE (DE) | 2008-10-15 | — | — | CN | disclosed |