Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MT-CO2 | P00403 | 6/20 | 0.43 |
| ▸ | ALOX5 | P09917 | 6/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | CA4 | P22748 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | CREBBP | Q92793 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4374227 | 0.94 | MT-CO2 (0.46) | MT-CO2ALOX5CA1CA2CA4 | |
| SCHEMBL10719777 | 0.94 | MT-CO2 (0.46) | MT-CO2ALOX5CA1CA2CA4 | |
| SCHEMBL6535460 | 0.94 | MT-CO2 (0.46) | MT-CO2ALOX5CA1CA2CA4 | |
| Ethylene SCHEMBL9360523 | 0.88 | MT-CO2 (0.43) | MT-CO2ALOX5CA1CA2CA4 | |
| SCHEMBL2982970 | 0.88 | CA1 (0.52) | MT-CO2ALOX5CA1CA2CA4 | |
| SCHEMBL28961100 | 0.87 | CA1 (0.35) | MT-CO2ALOX5CA1CA2CA4 | |
| SCHEMBL6673136 | 0.87 | CA1 (0.35) | MT-CO2ALOX5CA1CA2CA4 | |
| SCHEMBL535670 | 0.85 | CA1 (0.55) | MT-CO2ALOX5CA1CA2CA4 | |
| SCHEMBL8917568 | 0.83 | CA1 (0.38) | MT-CO2ALOX5CA1CA2CA4 | |
| SCHEMBL6769544 | 0.82 | KMT2A (0.56) | MT-CO2ALOX5CA1CA2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210026246-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-01-28 | — | — | US | disclosed |