SCHEMBL22924729

SCHEMBL22924729

O=C(O)c1cccc(CCCI)c1

nearest known ligand 0.58

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ FOLH1 Q04609 5/20 0.58
▸ CYP2D6 P10635 1/20 0.47
▸ CYP2C9 P11712 1/20 0.47
▸ HIF1A Q16665 1/20 0.47
▸ ANPEP P15144 1/20 0.47
▸ ENPEP Q07075 1/20 0.47
▸ MEP1B Q16820 2/20 0.46
▸ KMT2A Q03164 1/20 0.46
▸ CYP4F2 P78329 1/20 0.46
▸ CYP4A11 Q02928 1/20 0.46
▸ NR4A2 P43354 1/20 0.46
▸ CA12 O43570 1/20 0.46
▸ CA1 P00915 1/20 0.46
▸ CA2 P00918 1/20 0.46
▸ CA6 P23280 1/20 0.46
▸ CA9 Q16790 1/20 0.46
▸ MEP1A Q16819 1/20 0.45
▸ MRGPRX4 Q96LA9 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1541757 0.89 FOLH1 (0.61) FOLH1CYP2D6CYP2C9HIF1AANPEP
SCHEMBL16559877 0.89 FOLH1 (0.66) FOLH1CYP2D6CYP2C9HIF1AANPEP
SCHEMBL1980273 0.85 FOLH1 (0.61) FOLH1CYP2D6CYP2C9HIF1AKMT2A
SCHEMBL371526 0.85 FOLH1 (0.70) FOLH1CYP2D6CYP2C9HIF1AANPEP
SCHEMBL5473039 0.84 CYP4F2 (0.62) FOLH1CYP2D6CYP2C9HIF1AANPEP
SCHEMBL18551279 0.82 HDAC3 (0.63) FOLH1CYP2D6CYP2C9HIF1AANPEP
SCHEMBL3387825 0.82 FOLH1 (0.58) FOLH1CYP4F2CYP4A11MRGPRX4
SCHEMBL7556820 0.82 FOLH1 (0.58) FOLH1CYP2D6CYP2C9HIF1AANPEP
SCHEMBL5280086 0.82 CYP4F2 (0.67) FOLH1CYP2D6CYP2C9HIF1AANPEP
SCHEMBL31124111 0.82 FOLH1 (0.58) FOLH1CYP4F2CYP4A11MRGPRX4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210026246-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-28 — — US disclosed
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