⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14568510 | 0.66 | — | — | |
| SCHEMBL22073526 | 0.61 | CYP2C9 (0.35) | — | |
| SCHEMBL13765655 | 0.61 | — | — | |
| SCHEMBL14491249 | 0.61 | — | — | |
| SCHEMBL14510016 | 0.58 | — | — | |
| SCHEMBL21444767 | 0.58 | MEN1 (0.32) | — | |
| SCHEMBL19217890 | 0.58 | — | — | |
| SCHEMBL14620939 | 0.57 | — | — | |
| SCHEMBL10164053 | 0.57 | — | — | |
| SCHEMBL12693513 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11834419-B2 | Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern | LG CHEM, LTD. (KR) | 2023-12-05 | — | — | US | disclosed |
| US-20210032208-A1 | COMPOUND, PHOTORESIST COMPOSITION COMPRISING SAME, PHOTORESIST PATTERN COMPRISING SAME, AND METHOD FOR MANUFACTURING PHOTORESIST PATTERN | LG CHEM, LTD. (KR) | 2021-02-04 | — | — | US | disclosed |