Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12986568 | 0.75 | CYP19A1 (0.42) | CYP19A1 | |
| SCHEMBL24375929 | 0.75 | CYP19A1 (0.35) | CYP19A1 | |
| SCHEMBL6079757 | 0.73 | CYP19A1 (0.44) | CYP19A1MEN1KMT2A | |
| SCHEMBL12986569 | 0.73 | CYP19A1 (0.41) | CYP19A1 | |
| SCHEMBL14655836 | 0.73 | CYP19A1 (0.41) | CYP19A1 | |
| SCHEMBL25383029 | 0.73 | CYP19A1 (0.44) | CYP19A1MEN1KMT2A | |
| SCHEMBL135404 | 0.73 | CYP19A1 (0.41) | CYP19A1MEN1KMT2A | |
| SCHEMBL4872716 | 0.73 | CYP19A1 (0.44) | CYP19A1MEN1KMT2A | |
| SCHEMBL14982574 | 0.73 | CYP19A1 (0.41) | CYP19A1MEN1KMT2A | |
| SCHEMBL12812736 | 0.71 | CYP19A1 (0.43) | CYP19A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11586110-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-21 | — | — | US | disclosed |
| US-20210033971-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-04 | — | — | US | disclosed |