SCHEMBL2296133

SCHEMBL2296133

C=CCCc1cc(O)ccc1C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.38
TSHR P16473 2/20 0.38
RECQL P46063 1/20 0.38
ACHE P22303 2/20 0.37
GAA P10253 1/20 0.37
TYR P14679 3/20 0.36
TAAR1 Q96RJ0 1/20 0.36
GPR84 Q9NQS5 1/20 0.33
OPRM1 P35372 2/20 0.33
OPRD1 P41143 2/20 0.33
OPRK1 P41145 2/20 0.33
PTPN2 P17706 1/20 0.33
PTPN1 P18031 1/20 0.33
PTPN11 Q06124 1/20 0.33
MEN1 O00255 1/20 0.33
TP53 P04637 1/20 0.33
ALOX5 P09917 1/20 0.33
MAPT P10636 1/20 0.33
ALOX15 P16050 1/20 0.33
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2297154 0.85 TYR (0.41) CYP3A4TSHRGAATYRMEN1
SCHEMBL29952456 0.81 CYP3A4 (0.38) CYP3A4TSHRRECQLACHEGAA
SCHEMBL4564610 0.81 GABRA1 (0.50) CYP3A4TSHRRECQLACHEGAA
SCHEMBL7734929 0.81 TAAR1 (0.57) GAATAAR1OPRK1MEN1TP53
SCHEMBL21728222 0.78 CYP3A4 (0.39) CYP3A4GAATAAR1OPRM1OPRK1
SCHEMBL21728085 0.78 MEN1 (0.37) TAAR1OPRM1OPRK1MEN1HTT
SCHEMBL13971494 0.76 CYP3A4 (0.52) CYP3A4TSHRRECQLACHETYR
SCHEMBL27885749 0.75 CYP3A4 (0.41) CYP3A4TSHRRECQLACHEGAA
SCHEMBL12802119 0.74 NPSR1 (0.39) TSHRMAPT
Sulfuric Acid SCHEMBL15238310 0.74 POLB (0.49) CYP3A4TSHRRECQLGAAPTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8003298-B2 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2011-08-23 US disclosed
US-8003298-B2 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2011-08-23 US disclosed
US-8003298-B2 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2011-08-23 US disclosed
US-20100104982-A1 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2010-04-29 US disclosed
US-20100104982-A1 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2010-04-29 US disclosed
US-20100104982-A1 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2010-04-29 US disclosed
US-7659048-B2 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2010-02-09 US disclosed
US-7659048-B2 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2010-02-09 US disclosed
US-7659048-B2 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2010-02-09 US disclosed
US-20070287099-A1 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2007-12-13 US disclosed
US-20070287099-A1 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2007-12-13 US disclosed
US-20070287099-A1 Printing resist, method for preparing the same and patterning method using the same LG DISPLAY CO., LTD. (KR) 2007-12-13 US disclosed