SCHEMBL22972020

SCHEMBL22972020

CCCCc1ccc2c3c(cccc13)C(=O)N(O)C2=O

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 5/20 0.57
▸ POLB P06746 3/20 0.57
▸ MAPT P10636 3/20 0.57
▸ HTT P42858 3/20 0.57
▸ LMNA P02545 3/20 0.57
▸ XBP1 P17861 2/20 0.57
▸ KDM4E B2RXH2 2/20 0.57
▸ ALDH1A1 P00352 2/20 0.57
▸ PABPC1 P11940 1/20 0.57
▸ NFKB1 P19838 1/20 0.57
▸ SMARCA2 P51531 1/20 0.57
▸ NFKB2 Q00653 1/20 0.57
▸ RELA Q04206 1/20 0.57
▸ TDP1 Q9NUW8 3/20 0.54
▸ ERCC1 P07992 2/20 0.54
▸ FEN1 P39748 2/20 0.54
▸ ERCC4 Q92889 2/20 0.54
▸ CYP1A2 P05177 1/20 0.54
▸ TSHR P16473 1/20 0.54
▸ ALOX12 P18054 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9162685 0.84 DYRK3 (0.55) KMT2APOLBMAPTHTTLMNA
SCHEMBL31365971 0.81 TYMS (0.50) KMT2APOLBMAPTHTTLMNA
SCHEMBL17133796 0.81 TYMS (0.50) KMT2APOLBMAPTHTTLMNA
SCHEMBL17231438 0.79 TDP1 (0.44) KMT2APOLBMAPTHTTLMNA
SCHEMBL22972417 0.79 TAF1 (0.39) KMT2APOLBMAPTHTTLMNA
SCHEMBL4217926 0.78 ELANE (0.52) MAPTKDM4EPABPC1TAF1BRD1
SCHEMBL17231425 0.77 TDP1 (0.42) KMT2APOLBMAPTHTTLMNA
SCHEMBL13829366 0.77 KMT2A (0.50) KMT2APOLBMAPTHTTLMNA
SCHEMBL3392594 0.77 MEN1 (0.57) KMT2APOLBMAPTHTTLMNA
SCHEMBL17231426 0.76 TDP1 (0.41) KMT2APOLBMAPTHTTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021024925-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD FOR PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD FOR PATTERNED RESIST FILM, AND PRODUCTION METHOD FOR COMPOUND, PHOTO-ACID GENERATOR, AND N–ORGANOSULFONYLOXY COMPOUND 東京応化工業株式会社 2021-02-11 — — WO disclosed
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