SCHEMBL17133796

SCHEMBL17133796

CCCCc1ccc2c3c(cccc13)C(=O)OC2=O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TYMS P04818 5/20 0.50
▸ ELANE P08246 6/20 0.45
▸ CTSG P08311 4/20 0.45
▸ MEN1 O00255 2/20 0.41
▸ POLB P06746 2/20 0.41
▸ KMT2A Q03164 2/20 0.41
▸ CTRC Q99895 1/20 0.41
▸ TAF1 P21675 3/20 0.40
▸ BRD1 O95696 2/20 0.40
▸ BRPF1 P55201 2/20 0.40
▸ TAF1L Q8IZX4 1/20 0.40
▸ CREBBP Q92793 1/20 0.40
▸ CECR2 Q9BXF3 1/20 0.40
▸ BRPF3 Q9ULD4 1/20 0.40
▸ RGS12 O14924 1/20 0.39
▸ USP2 O75604 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ MAPK1 P28482 1/20 0.39
▸ HTT P42858 1/20 0.39
▸ ATM Q13315 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31365971 1.00 TYMS (0.50) TYMSELANECTSGMEN1POLB
SCHEMBL24757599 0.90 TYMS (0.53) TYMSELANECTSGMEN1POLB
SCHEMBL10693232 0.85 TYMS (0.58) TYMSMEN1POLBKMT2ARGS12
SCHEMBL4217926 0.81 ELANE (0.52) ELANECTSGTAF1BRD1BRPF1
SCHEMBL22972020 0.81 KMT2A (0.57) ELANECTSGMEN1POLBKMT2A
SCHEMBL6390867 0.77 ELANE (0.38) TYMSELANECTSGMEN1KMT2A
SCHEMBL9162685 0.76 DYRK3 (0.55) MEN1POLBKMT2ATAF1BRD1
SCHEMBL30892135 0.76 ELANE (0.44) TYMSELANECTSGCTRCTDP1
SCHEMBL6412557 0.76 ELANE (0.44) TYMSELANECTSGCTRCTDP1
SCHEMBL1354118 0.75 TYMS (0.60) TYMSMEN1POLBKMT2ARGS12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220283500-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD FOR PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD FOR PATTERNED RESIST FILM, COMPOUND, PHOTO-ACID GENERATOR, AND PRODUCTION METHOD FOR N-ORGANOSULFONYLOXY COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2022-09-08 — — US disclosed
CN-114207524-A Resin composition, dry film, resist film, compound, acid generator, and method for producing N-organic sulfonyloxy compound 东京应化工业株式会社 2022-03-18 — — CN disclosed
WO-2021024925-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD FOR PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD FOR PATTERNED RESIST FILM, AND PRODUCTION METHOD FOR COMPOUND, PHOTO-ACID GENERATOR, AND N–ORGANOSULFONYLOXY COMPOUND 東京応化工業株式会社 2021-02-11 — — WO disclosed
EP-2927216-B1 NOVEL SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, CATIONIC POLYMERIZATION INITIATOR, RESIST COMPOSITION, AND CATIONICALLY POLYMERIZABLE COMPOSITION ADEKA CORP (JP) 2018-10-24 — — EP disclosed
CN-104822662-B New sulfonic acid compound, photoacid generator, cationic polymerization initiators, anti-corrosion agent composition and cationically polymerizable composition 株式会社ADEKA 2018-04-03 — — CN disclosed
US-20150315153-A1 NOVEL SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, CATIONIC POLYMERIZATION INITIATOR, RESIST COMPOSITION, AND CATIONICALLY POLYMERIZABLE COMPOSITION ADEKA CORPORATION (JP) 2015-11-05 — — US disclosed
EP-2927216-A1 NOVEL SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, CATIONIC POLYMERIZATION INITIATOR, RESIST COMPOSITION, AND CATIONICALLY POLYMERIZABLE COMPOSITION Adeka Corporation (JP) 2015-10-07 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220283500-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD FOR PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD FOR PATTERNED RESIST FILM, COMPOUND, PHOTO-ACID GENERATOR, AND PRODUCTION METHOD FOR N-ORGANOSULFONYLOXY COMPOUND ASIC1, ASIC3, DAP3 TYMS 3512/4885ELANE 3388/4885CTSG 2423/4885
US-20150315153-A1 NOVEL SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, CATIONIC POLYMERIZATION INITIATOR, RESIST COMPOSITION, AND CATIONICALLY POLYMERIZABLE COMPOSITION ALAD, ARSA, AHR TYMS 3427/4885ELANE 3922/4885CTSG 3036/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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