Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18183431 | 0.98 | MEN1 (0.34) | MEN1KMT2AMAPTATMALDH1A1 | |
| SCHEMBL18183389 | 0.85 | MEN1 (0.38) | MEN1KMT2AMAPTATMALDH1A1 | |
| SCHEMBL20204699 | 0.85 | MEN1 (0.44) | MEN1KMT2AMAPTALDH1A1THRB | |
| SCHEMBL18183390 | 0.85 | MEN1 (0.36) | MEN1KMT2AMAPTATMALDH1A1 | |
| SCHEMBL18183415 | 0.85 | MEN1 (0.36) | MEN1KMT2AMAPTATMALDH1A1 | |
| SCHEMBL18183392 | 0.85 | MEN1 (0.36) | MEN1KMT2AMAPTATMALDH1A1 | |
| SCHEMBL4398429 | 0.83 | — | — | |
| SCHEMBL18183391 | 0.81 | MEN1 (0.31) | MEN1KMT2A | |
| SCHEMBL18183396 | 0.79 | MEN1 (0.34) | MEN1KMT2AMAPTATMALDH1A1 | |
| SCHEMBL18603297 | 0.79 | MEN1 (0.31) | MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111936936-B | Imidazolidinone-containing compositions for removal of post-ash residues and/or for oxide etching of TiN-containing layers or masks | 巴斯夫欧洲公司 | 2025-02-21 | — | — | CN | disclosed |
| US-12024693-B2 | Imidazolidinethione-containing compositions for post-ash residue removal and/or for oxidative etching of a layer or mask comprising TiN | BASF SE (DE) | 2024-07-02 | — | — | US | disclosed |
| EP-3776083-B1 | IMIDAZOLIDINETHIONE-CONTAINING COMPOSITIONS FOR POST-ASH RESIDUE REMOVAL AND/OR FOR OXIDATIVE ETCHING OF A LAYER OR MASK COMPRISING TIN | BASF SE (DE) | 2022-03-02 | — | — | EP | disclosed |
| US-20210189298-A1 | IMIDAZOLIDINETHIONE-CONTAINING COMPOSITIONS FOR POST-ASH RESIDUE REMOVAL AND/OR FOR OXIDATIVE ETCHING OF A LAYER OR MASK COMPRISING TiN | BASF SE (DE) | 2021-06-24 | — | — | US | disclosed |
| EP-3776083-A1 | IMIDAZOLIDINETHIONE-CONTAINING COMPOSITIONS FOR POST-ASH RESIDUE REMOVAL AND/OR FOR OXIDATIVE ETCHING OF A LAYER OR MASK COMPRISING TIN | BASF SE (DE) | 2021-02-17 | — | — | EP | disclosed |
| CN-111936936-A | Imidazolidinethione-containing compositions for removing post-ashing residues and/or for oxidatively etching TiN-containing layers or masks | 巴斯夫欧洲公司 | 2020-11-13 | — | — | CN | disclosed |