SCHEMBL2297929

SCHEMBL2297929

CC1CCC(O)CN1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7914511 1.00
SCHEMBL30782476 1.00
SCHEMBL17061707 1.00
SCHEMBL2924066 1.00
SCHEMBL2924068 1.00
SCHEMBL25040954 1.00
Hydrochloric Acid SCHEMBL14880473 0.97
Hydrochloric Acid SCHEMBL14880475 0.97
Hydrochloric Acid SCHEMBL16198457 0.97
Hydrochloric Acid SCHEMBL31404651 0.97

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3154937-B1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY (US) 2024-05-22 EP claimed
CN-117881397-A Heterocyclic compounds and methods of use 安进公司 2024-04-12 CN claimed
EP-3154937-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM Fina Technology, Inc. (US) 2017-04-19 EP claimed
US-20170089503-A1 Chlorine-resistant Polyethylene Compound and Articles Made Therefrom TOTAL AMERICAN SERVICES, INC. 2017-03-30 US claimed
CN-106458883-A Chlorine resistant polyethylene compounds and articles made therefrom 弗纳技术股份有限公司 2017-02-22 CN claimed
WO-2015191721-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY, INC. (US) 2015-12-17 WO claimed
US-4240922-A STERICALLY HINDERED AMINES INCLUDING HETEROCYCLIC COMPOUNDS AND TERTIARY AMINO ALCOHOLS INCREASE CARBON DIOXIDE ABSORBANCE EXXON RESEARCH & ENGINEERING CO. (US) 1980-12-23 US claimed
US-4217237-A Process for removing carbon dioxide containing acidic gases from gaseous mixtures using a basic salt activated with a hindered amine EXXON RESEARCH & ENGINEERING CO. (US) 1980-08-12 US claimed
US-4112050-A Process for removing carbon dioxide containing acidic gases from gaseous mixtures using a basic salt activated with a hindered amine EXXON RESEARCH & ENGINEERING CO. (US) 1978-09-05 US claimed
US-4100257-A Process and amine-solvent absorbent for removing acidic gases from gaseous mixtures EXXON RESEARCH & ENGINEERING CO. (US) 1978-07-11 US claimed
US-12398154-B2 Azaquinazoline pan-KRas inhibitors Mirati Therapeutics, Inc. (US) 2025-08-26 US disclosed
EP-3154937-B1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY (US) 2024-05-22 EP disclosed
CN-117881397-A Heterocyclic compounds and methods of use 安进公司 2024-04-12 CN disclosed
EP-4262807-A1 AZAQUINAZOLINE PAN-KRAS INHIBITORS Mirati Therapeutics, Inc. (US) 2023-10-25 EP disclosed
WO-2023061294-A1 NITROGEN-CONTAINING HETEROCYCLIC DERIVATIVE REGULATOR, PREPARATION METHOD THEREFOR AND APPLICATION THEREOF 再鼎医药(上海)有限公司 2023-04-20 WO disclosed
US-4112051-A Process and amine-solvent absorbent for removing acidic gases from gaseous mixtures EXXON RESEARCH & ENGINEERING CO. (US) 1978-09-05 US disclosed
US-4112052-A Process for removing carbon dioxide containing acidic gases from gaseous mixtures using aqueous amine scrubbing solutions EXXON RESEARCH & ENGINEERING CO. (US) 1978-09-05 US disclosed
US-4101633-A BY MIXING WITH AMINO ALCOHOLS EXXON RESEARCH & ENGINEERING CO. (US) 1978-07-18 US disclosed
US-4100257-A Process and amine-solvent absorbent for removing acidic gases from gaseous mixtures EXXON RESEARCH & ENGINEERING CO. (US) 1978-07-11 US disclosed
US-4094957-A CARBON DIOXIDE EXXON RESEARCH & ENGINEERING CO. (US) 1978-06-13 US disclosed