Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.44 |
| ▸ | CES1 | P23141 | 1/20 | 0.44 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.38 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.32 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | HSD11B2 | P80365 | 1/20 | 0.31 |
| ▸ | SLC1A3 | P43003 | 2/20 | 0.31 |
| ▸ | SLC1A2 | P43004 | 2/20 | 0.31 |
| ▸ | SLC1A1 | P43005 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22986742 | 0.98 | CES2 (0.40) | CES2CES1HDAC8HDAC6TSHR | |
| SCHEMBL2005030 | 0.73 | CES2 (0.43) | CES2CES1HDAC8HDAC6TSHR | |
| SCHEMBL3495827 | 0.73 | CES2 (0.44) | CES2CES1HDAC8HDAC6TSHR | |
| SCHEMBL24520292 | 0.73 | CES2 (0.44) | CES2CES1HDAC8HDAC6TSHR | |
| SCHEMBL17351371 | 0.70 | CES2 (0.40) | CES2CES1HDAC8HDAC6TSHR | |
| SCHEMBL8127287 | 0.70 | CES2 (0.41) | CES2CES1HDAC8HDAC6TSHR | |
| SCHEMBL4938309 | 0.69 | CES2 (0.38) | CES2CES1HDAC8HDAC6TSHR | |
| SCHEMBL16674533 | 0.69 | CES2 (0.50) | CES2CES1HDAC8HDAC6TSHR | |
| SCHEMBL11714520 | 0.69 | CES2 (0.50) | CES2CES1HDAC8HDAC6TSHR | |
| SCHEMBL2600359 | 0.69 | CES2 (0.50) | CES2CES1HDAC8HDAC6TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11720020-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| US-20210048746-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-18 | — | — | US | disclosed |